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Cold isostatic pressing forming mold and method for preparing rotary target blank

A technology of cold isostatic pressing and target material production, which is applied in the direction of molds, manufacturing tools, ceramic forming cores, etc., can solve the problems of irregular outer surface, uneven target wall thickness, low production efficiency, etc., and achieve the outer surface Regular, uniform wall thickness effect

Pending Publication Date: 2021-08-06
广州市尤特新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In actual production, since the forming mold needs to be pressed into the liquid medium together with the powder to be formed, the soft rubber sleeve of the forming mold is prone to deformation after repeated pressing, resulting in the deformation of the cavity of the forming mold, resulting in the pressed product. The shape of the target green embryo is irregular
For the uneven wall thickness and irregular outer surface of the target obtained after sintering such a green body, more targets need to be turned to obtain a usable cylindrical rotating target, which leads to low production efficiency and waste of raw materials

Method used

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  • Cold isostatic pressing forming mold and method for preparing rotary target blank
  • Cold isostatic pressing forming mold and method for preparing rotary target blank
  • Cold isostatic pressing forming mold and method for preparing rotary target blank

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Embodiment Construction

[0030] The invention will be described in further detail below in conjunction with specific embodiments.

[0031] The cold isostatic pressing mold is used to form the raw material of the rotating target. The principle is to put the raw material powder to be formed into the cavity of the molding mold after the pretreatment process, and then put the mold body together with the powder. In the cold isostatic pressing liquid medium environment, the liquid medium is used to pressurize the mold, so that the powder is pressed into a cylindrical shape consistent with the mold cavity, and the required rotating target green body can be obtained by taking the material after the mold is opened.

[0032] See figure 1 , The mold body 2 of the cold isostatic pressing mold 1 includes a cylindrical rigid inner mold core 3 and a cylindrical soft outer mold 4 . See figure 2 and image 3 , the top and bottom of the rigid inner mold core 3 are provided with horizontal handles 31 for gripping, a...

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Abstract

The invention relates to the field of rotary target material machining, in particular to a cold isostatic pressing forming mold for preparing a rotary target blank and a cold isostatic pressing forming method for preparing the rotary target blank. The cold isostatic pressing forming mold for preparing the rotary target blank comprises a mold main body, the mold main body comprises a rigid inner mold core and a soft outer mold, and a mold cavity is formed between the soft outer mold and the rigid inner mold core to accommodate powder to be formed. The forming mold comprises a molding piece and a driving device which are arranged on the outer side of the soft outer mold. The driving device drives the molding piece to move towards the inner side until the soft outer mold is clamped for molding. The invention further provides a cold isostatic pressing forming method for preparing the rotary target blank. According to the forming mold and the forming method, the regular rotary target blank can be obtained through compression forming, more targets do not need to be turned off after the blank is sintered, the production efficiency is high, and waste of raw materials is reduced.

Description

technical field [0001] The invention relates to the field of rotating target material processing, in particular to a cold isostatic pressing forming mold for preparing a rotating target green embryo and a cold isostatic pressing forming method for preparing a rotating target green embryo. Background technique [0002] The coating target is a sputtering source that forms various functional thin films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. It is often used in semiconductor processing and other industries. As a target material, the rotating target is cylindrical and is commonly used in the magnetron sputtering coating process. To make a rotating target, it is necessary to pre-process the raw materials such as grinding and granulation to obtain the powder to be formed, and put the powder into a cylindrical mold with a soft rubber sleeve on the outer mold and a rigi...

Claims

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Application Information

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IPC IPC(8): B28B3/00B28B1/087B28B7/16B28B7/28B28B13/02
CPCB28B1/087B28B3/003B28B7/16B28B7/28B28B13/02
Inventor 谌畅周志宏雷雨周昭宇汪政军
Owner 广州市尤特新材料有限公司