Structure parameter optimization method of chiral super-structure surface and micro-nano device

A technology of structural parameters and metasurfaces, which is applied to the structural parameter optimization method of chiral metasurfaces and the field of micro-nano devices, can solve the problems of decreased search accuracy, unavailability, exponential time increase, etc., so as to reduce the time, Effects of optimizing spectral response, increasing speed, and optimizing effects

Active Publication Date: 2021-08-17
BEIJING UNIV OF POSTS & TELECOMM
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the process of designing a metasurface, it is usually necessary to optimize its structural parameters. The traditional methods include manual search and parameter scanning. These methods can only search for the optimal solution in a very small parameter space. With the parameter As the space increases, the time required will increase exponentially, and the accuracy of the search will also decrease, so the above method cannot be used under complex optimization objectives

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Structure parameter optimization method of chiral super-structure surface and micro-nano device
  • Structure parameter optimization method of chiral super-structure surface and micro-nano device
  • Structure parameter optimization method of chiral super-structure surface and micro-nano device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048]In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, the embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings. Here, the exemplary embodiments and descriptions of the present invention are used to explain the present invention, but not to limit the present invention.

[0049] Here, it should be noted that, in order to avoid obscuring the present invention due to unnecessary details, only the structures and / or processing steps that are closely related to the solution according to the present invention are shown in the drawings, while those related to the present invention are omitted. Invent other details that don't really matter.

[0050] It should be emphasized that the term "comprises / comprises / has" when used herein refers to the presence of a feature, element, step or component, but does not exclude the presence or addition of one...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a structure parameter optimization method for a chiral super-structure surface and a micro-nano device, and the method comprises the steps: determining a parameter space of structure parameters based on the optimization range of the structure parameters, and determining an initial population according to the parameter space of the structure parameters; obtaining the transmissivity of the left-handed circularly polarized light and the right-handed circularly polarized light of the chiral metasurface corresponding to each individual in the population under the target wavelength by using a finite difference time domain algorithm, and solving the difference value; determining the fitness of each individual based on the obtained transmissivity difference value corresponding to each individual; selecting, crossing and mutating the individuals in the initial population based on the fitness of each individual, and generating an optimized population; and selecting an individual corresponding to the minimum transmissivity difference value of the left-handed circularly polarized light and the right-handed circularly polarized light under the target wavelength from the optimized population as an optimal structure parameter of the chiral super-structure surface, wherein the individual corresponds to the minimum transmissivity difference value of the left-handed circularly polarized light and the right-handed circularly polarized light under the target wavelength. By adopting the method, the optimal structure parameters of the chiral super-structure surface can be quickly and accurately obtained in a huge parameter space.

Description

technical field [0001] The invention relates to the technical field of electronic devices, in particular to a structural parameter optimization method of a chiral metasurface and micro-nano devices. Background technique [0002] A substance whose mirror image cannot be superimposed on either rotation or translation is said to be chiral, and it and its mirror image are called two oppositely chiral enantiomers. Chirality exists widely in nature and has applications in life sciences, sensing, imaging, and biomedicine; May be highly toxic. In addition, the chirality of the geometric structure can also be reflected in the optical chiral response, that is, chiral substances absorb differently for left-handed and right-handed circularly polarized light. The chiral optical response of natural chiral molecules is usually weak and difficult to be detected, so it is necessary to design artificial chiral structures to enhance the optical response of natural chiral molecules. [0003]...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06F30/23G06F30/27G06N3/12G06F111/08
CPCG06F30/23G06F30/27G06N3/126G06F2111/08
Inventor 桂丽丽廖祥莱冯懋宇王传硕于振明张天尹飞飞徐坤
Owner BEIJING UNIV OF POSTS & TELECOMM
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products