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Preparation method of vanadium dioxide film

A technology of vanadium dioxide and vanadium pentoxide, applied in the direction of vanadium oxide, nanotechnology for materials and surface science, nanotechnology, etc., can solve the problem of high cost of magnetron sputtering, achieve film thickness control, Ensure the uniformity of the film and avoid the effect of island growth

Inactive Publication Date: 2021-08-20
JILIN UNIV
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Benefits of technology

This patented technology describes methods used during manufacturing vanadic nitride films that are useful in various applications such as solar cells. These techniques involve reacting vanadia trioxane with ammonia gas followed by drying and heat treatment. By adjusting specific ratios of components like sulfur hexacarboxylic acids and hydrolysis solutions, these materials form vanadiumsulfonates containing vanadious metal atoms called V2O3. A certain type of material has been found to be particularly suitable because they have good optical properties when excited near ultraviolet rays. They may improve their performance in electronic devices due to its ability to absorb sunlight efficiently over longer periods of time than before being exposed to UV radiation.

Problems solved by technology

This patented technical problem addressed in this patents relates to finding ways to improve the performance characteristics (visible light transmissibility/intensiveness), including reducing sensitivity towards heat waves and improving response times over conventional vanadic oxides.

Method used

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  • Preparation method of vanadium dioxide film
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  • Preparation method of vanadium dioxide film

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preparation example Construction

[0041] The invention provides a kind of preparation method of vanadium dioxide film, comprises the following steps:

[0042] (1) Mix vanadium pentoxide powder, hydrazine monohydrochloride, hydrochloric acid and water, and carry out redox reaction at a temperature of 60-80°C to obtain a vanadium oxychloride precursor;

[0043] The mass ratio of described vanadium pentoxide powder, hydrazine monohydrochloride, hydrochloric acid and water is (3.4~3.8):(0.8~1.1):(6~6.8):20, and the mass concentration of described hydrochloric acid is 36~ 38%;

[0044] (2) mixing the vanadium oxychloride precursor solution with water to obtain a diluted precursor solution; the concentration of vanadium ions in the diluted precursor solution is 0.6 to 1mol / L;

[0045] (3) mixing the diluted precursor solution with polyvinylpyrrolidone to obtain a vanadium sol;

[0046] (4) pre-coating, spin-coating and drying the vanadium sol on the substrate surface in sequence to obtain a vanadium gel coating; ...

Embodiment 1

[0058] (1) Weigh 3.6g V 2 o 5 Add the powder into 20mL of deionized water, stir in a water bath at 80°C for 10min, then add 1g of hydrazine monohydrochloride, add dropwise 6mL of concentrated hydrochloric acid with a mass fraction of 38% (hydrochloric acid is added dropwise within 0.5h), dropwise After that, continue to stir for 0.5h, take it out and let it stand for 5h at room temperature to obtain the vanadium oxychloride precursor solution (blue clear solution);

[0059](2) Add water to the vanadium oxychloride precursor solution to obtain a diluted precursor solution, the concentration of vanadium ions in the diluted precursor solution is 1.1mol / L; add polyvinylpyrrolidone (K90) to the diluted precursor solution, and stir for 6 hours to form vanadium Sol, the massfraction of polyvinylpyrrolidone in the vanadium gel is 4.3%;

[0060] (3) Take a quartz glass substrate, first use detergent to ultrasonically clean the substrate for 15 minutes, and then place the substrate at...

Embodiment 2

[0064] Change the concentration of vanadium ions in the diluted precursor solution to 0.6mol / L, change the spin coating speed to 5000r / min, change the annealing holding time to 180min, and the rest are the same as in Example 1 to prepare a yellow-brown vanadium dioxide film.

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Abstract

The invention provides a preparation method of a vanadium dioxide film, and relates to the technical field of functional materials. The preparation method comprises the steps of mixing vanadium pentoxide powder, hydrazine monohydrochloride, hydrochloric acid and water, and carrying out oxidation-reduction reaction to obtain a vanadium oxychloride precursor solution; mixing the vanadium oxychloride precursor solution with water to obtain a diluted precursor solution; mixing the diluted precursor solution with polyvinylpyrrolidone to obtain vanadium sol; sequentially carrying out pre-coating, spin-coating and drying on the vanadium sol on the surface of the substrate to obtain a vanadium gel coating; and annealing the vanadium gel coating under the anaerobic condition to obtain the vanadium dioxide film. According to the method, a sol-gel method is adopted, all process parameters are strictly controlled, good balance between visible light transmission and infrared mutation rate of the vanadium dioxide film can be achieved under the conditions of no doping and single-layer film, the infrared mutation rate at the 2500nm infrared band reaches up to 69.7%, and the visible light transmission rate reaches up to 38.1%; and the operation is simple and convenient, and the cost is low.

Description

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Claims

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Application Information

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Owner JILIN UNIV
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