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A method and device for processing LED chips on sapphire substrates

A technology for LED chips and sapphire substrates, applied in the field of processing sapphire substrate LED chips, can solve the problems of chip leakage, micro-crack expansion, affecting luminous efficiency, etc., to meet high-precision processing requirements, stable and reliable driving, and motion accuracy. high effect

Active Publication Date: 2021-11-30
江苏佳晟精密设备科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Generally, single-spot implicit cutting can only be aimed at relatively thin LED wafers with a thickness of 80-150um. Focusing and scribing at a position 1 / 3 from the surface forms a modified layer, and then separates them by film expansion or mechanical splitting. Although The glue coating process is avoided, but this method cannot process thicker LED wafers, because the depth of the single-spot modified layer is generally 10-80um, the crack tendency is limited, and it is easy to cause oblique cracks or even twin crystal problems when mechanically split
[0010] Multi-spot implicit cutting, the overall cutting depth is often greater than 1 / 2 of the chip thickness. Although the processing efficiency is improved and the depth of the modified layer is increased, the film can be separated without mechanical splitting, and the problem of oblique cracking and twin crystals is avoided. , but the increase of the modified layer on the side of the LED wafer also means that the area that destroys the sapphire lattice structure increases accordingly, which affects the luminous efficiency of the LED and is prone to chip leakage
[0011] Whether it is surface cutting or stealth cutting, both of them are directly stripped or modified by laser on the LED chip, and the width of the modified layer is often close to 1 / 3-1 / 2 of the thickness of the LED chip or larger, even if the process is optimized parameters to reduce sputtering, collapse, oblique cracks, double crystals, etc., but because the essence of LED wafer chips is to emit light and be durable, a deeper modified layer not only affects the luminous efficiency, but also reduces the quality of a single LED chip. In later use, due to the heating of the LED chip, it is more likely to cause micro-cracks to expand, thereby shortening the service life of the LED chip

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  • A method and device for processing LED chips on sapphire substrates
  • A method and device for processing LED chips on sapphire substrates
  • A method and device for processing LED chips on sapphire substrates

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Embodiment 1

[0050] refer to figure 1 , a method for processing a sapphire substrate LED chip is proposed in this embodiment, comprising the following steps:

[0051] S1: First, use a scribing laser to scribe on the sapphire surface of the LED wafer, and form deep initial cracks on the sapphire surface of the LED wafer;

[0052] S2: heating the initial crack and the sapphire surface of the LED wafer on both sides along the extension direction of the initial crack;

[0053] S3: cooling the initial crack and the sapphire surface of the LED wafer on both sides along the extension direction of the initial crack;

[0054] S4: Use the diamond cutter 500 to separate the LED wafer, and distribute the diamond cutter 500 and the surface of the LED wafer vertically. The diamond tool 500 is struck until the LED wafer is separated, so that the LED wafer is cracked along the corresponding initial cracks.

[0055] In S1, a scribing laser with a wavelength of 200-1000nm is used for scribing, and the de...

Embodiment 2

[0058] refer to figure 2 In this embodiment, a device for processing LED chips on a sapphire substrate is proposed, which includes two processing turntables 100 arranged side by side. The A-turntable 110 and the B-turntable 120 are arranged at intervals along the a direction, and the a-direction is located in the horizontal plane. The A-turntable 110 and the B-turntable 120 are equipped with a clamping mechanism 130 for fixing and limiting the LED wafer, above the A-turntable 110 A processing mechanism 200 is installed, and the A processing mechanism 200 is used for scribing, heating and cooling the LED wafer on the A turntable 110, and a B processing mechanism 300 is installed above the B turntable 120, and the B processing mechanism 300 is used for B processing. The LED wafer on the turntable 120 is subjected to fracturing treatment, the A processing mechanism 200 and the B processing mechanism 300 are connected to the adjustment mechanism 400, and the adjustment mechanism ...

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Abstract

The invention relates to the field of chip laser processing, and specifically discloses a method and device for processing a sapphire substrate LED chip. In the processing method proposed by the invention, a relatively shallow initial crack is first generated by scribing on the surface of the LED wafer, and then the initial crack is Heating and cooling at the place to make it generate stress, and then apply impact pressure to the initial crack along the direction perpendicular to the mirror surface of the LED wafer, and crush the LED wafer along the initial crack, so that the side surface of the LED wafer after fracturing can be achieved. It is smooth and mirror-like, and at the same time, the laser scribing depth is shallow, so that the depth of the reformed layer is shallow. The processing device proposed by the present invention can realize simultaneous laser scribing, heating and cooling treatments on the LED wafer. The airflow can discharge the molten material generated by laser scribing from the initial crack, avoiding bonding in the initial crack, and can also perform fracturing treatment on the LED wafer along the initial crack, and the fracturing spacing is consistent with the spacing between the initial cracks ,High precision.

Description

technical field [0001] The invention relates to the field of chip laser processing, in particular to a method and a device for processing a sapphire substrate LED chip. Background technique [0002] In recent years, sapphire substrate LED chips have been developing rapidly due to their advantages such as low energy consumption, high luminous efficiency, long life, green environmental protection, cold light source, fast response time, and can be used under various harsh conditions. A new generation of lighting sources. With the maturity of III-V semiconductor technology, the development of LED chips continues to develop in the direction of higher efficiency and higher brightness. As its application becomes more and more extensive, how to improve the luminous efficiency of GaN-based LEDs has increasingly become the focus of attention. The main factors affecting the luminous efficiency of LEDs are internal quantum efficiency and external quantum efficiency, and the improvement...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00H01L21/78B23K26/38B23K26/402B28D5/00B28D7/02B28D7/04
CPCH01L33/0095H01L33/007H01L21/78B23K26/38B23K26/402B28D5/0011B28D5/0052B28D5/0076
Inventor 陈炳寺戴磊
Owner 江苏佳晟精密设备科技有限公司
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