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Feeding and discharging method of working platform

A working platform and platform technology, which is applied to the exposure device of the photoengraving process, the microlithography exposure equipment, etc., can solve the problems that the large steel plate cannot be placed on the platform, cannot be hoisted by hooks, etc., and achieves improved practicability and simple operation. Effect

Pending Publication Date: 2021-10-22
GIS TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, such objects cannot be hoisted by installing hooks on them, and can only be carried by lifting.
The lifting method is to lift up the large steel plate with the lifting piece at the bottom of the large steel plate and other objects, but when it is transported to the working platform, the lifting piece cannot be directly separated from the large steel plate, resulting in the large steel plate cannot be placed on the platform

Method used

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  • Feeding and discharging method of working platform
  • Feeding and discharging method of working platform
  • Feeding and discharging method of working platform

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Embodiment Construction

[0042] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0043] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred mechanism or element must have a specific orientatio...

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Abstract

The invention relates to a feeding and discharging method of a working platform for photoetching equipment. The feeding and discharging method comprises the following steps: S1, starting a supporting assembly; S2, moving a workpiece to the working face of a platform by using a lifting piece, wherein the supporting assembly supports the workpiece; S3, separating the lifting piece from the workpiece; S4, enabling a pump body to blow air to multiple air holes, so that floating assemblies arranged in the air holes move in the air holes and at least partially protrude out of the working face; S5, closing the supporting assembly, so that the upper end face of the supporting assembly is parallel or lower than the working face, and the floating assembly supports the workpiece; S6, moving the workpiece to a target position, and fixing the workpiece on the working face; S7, after the workpiece is machined, starting the supporting assembly, wherein at least part of the supporting assembly protrudes out of the working face to support the workpiece; and S8, inserting the lifting piece into a gap between the workpiece and the working face so as to lift the workpiece and move the workpiece away from the working platform. According to the method, operation is easy, labor is saved, feeding and discharging of large-size or heavy workpieces can be easily achieved, and the practicability of the working platform is improved.

Description

technical field [0001] The invention relates to a working platform and photoetching equipment. Background technique [0002] Photolithography, that is, optical etching, is to irradiate light on the photoreactive material to make the photoreactive material react, usually by irradiating light on the photoreactive material according to a specific pattern to obtain the desired structure. Lithography is generally also called exposure, and the equipment for lithography is a photolithography machine or an exposure machine. [0003] Common lithographic objects are screens, dry films or glass coated with photoreactive materials. The screen is to fix the gauze on the wooden or steel frame, and coat the gauze with light-reactive materials. After exposure and subsequent processing, the screen can be used to print cloth. Dry film is a thin film coated with a photoreactive material, commonly used in the manufacture of PCB boards. Glass coated with photoreactive materials is often used ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/20
Inventor 陈国军吴景舟马迪
Owner GIS TECH INC