Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multilayer dielectric structure capable of being used for unidirectional optical stealth

A dielectric and dielectric layer technology, applied in optics, nonlinear optics, instruments, etc., can solve the problem of discounting the effect of stealth

Pending Publication Date: 2021-10-26
HUBEI UNIV OF SCI & TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when the wavelength is changed, the effect of stealth will be greatly reduced

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multilayer dielectric structure capable of being used for unidirectional optical stealth
  • Multilayer dielectric structure capable of being used for unidirectional optical stealth
  • Multilayer dielectric structure capable of being used for unidirectional optical stealth

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0034] (1) Material selection. Select dielectrics A, A', B and B', where the substrates of A and A' are silicon dioxide, and the substrates of B and B' are silicon, and their refractive indices are complex values, respectively 3.53+0.01qi , 1.46-0.01qi, 3.53-0.01qi and 1.46+0.01qi, where q is the gain-loss factor, the loss is obtained by doping metal ions, and the gain is introduced by nonlinear two-wave mixing.

[0035] (2) Structural design. Divide the above dielectric in accordance with the two S 4 The T-M sequence of T-M sequence is stacked in turn, and then the dielectric refractive index is modulated so that it satisfies n(z)=n*(-z) in space, which conforms to the PT symmetric structure. The PT symmetric multilayer dielectric can be recorded as TM 4 =ABBABAABB'A'A'B'A'B'B'A' (such as figure 1 ).

[0036] (3) Realize the one-way (reverse) optical stealth of specific wavelength. The input light is selected as a transverse magnetic wave, and the gain-loss factor is set...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a multilayer dielectric structure capable of being used for unidirectional optical stealth, and belongs to the technical field of optical stealth devices. The multi-layer dielectric structure comprises two Thue-Morse (T-M) sequences which are distributed in a space-time symmetry manner, and the iteration rule of the T-M sequence SN is that S1=A, N=1; S2=AB, and N=2; SN=SN-1 (A->AB and B->BA), N is larger than or equal to 3, A->AB in SN-1 represents that A is replaced by AB, B->BA represents that B is replaced by BA, N represents the sequence number of the sequence, and SN represents the N item of the sequence; A is a first dielectric layer; B is a second dielectric layer; the first dielectric layer and the second dielectric layer are two kinds of uniform dielectric sheets with different refractive indexes, when incident light with a certain wavelength value enters from one side, the intensity of reflected light reflected by a multilayer dielectric structure is zero, and when light waves with the wavelength value enter from the other side, the intensity of the reflected light is not zero, and the one-way stealth of the incident light with the wavelength value is realized; and the stealth wavelength can be regulated and controlled by changing a gain-loss factor.

Description

technical field [0001] The invention belongs to the technical field of optical stealth devices and relates to a multilayer dielectric structure which can be used for one-way optical stealth. Background technique [0002] When an electromagnetic wave encounters an object, the object reflects or scatters the electromagnetic wave. If the reflectivity of the electromagnetic wave of the object is zero, the object cannot be observed through reflection, that is, the object is optically invisible to the electric field. Optical stealth is widely used in aircraft and submarines. For example, radar systems detect targets by detecting reflected light from objects. In order to realize the optical stealth of the object, it is necessary to design a clever optical structure so that the electromagnetic wave is completely absorbed or transmitted by the target, so as to achieve zero reflected light intensity. [0003] In recent years, the research of metamaterials has brought a new developme...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/00
CPCG02F1/0063
Inventor 倪浩张巍
Owner HUBEI UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com