Long-wave infrared photodetector structures formed on high-index substrates
A photoelectric detector and long-wave infrared technology, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of reducing the absorption coefficient and increasing the operating wavelength of photodetectors, etc.
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[0024] The present disclosure is directed to layered structures including superlattices that can be used for photodetection. A superlattice comprises a periodic structure of layers (eg, alternating layers of two materials, each layer having a defined thickness). In some embodiments, photodetector operation is based on light absorption through direct phototransitions in a type II superlattice (SL). Absorption occurs between (e.g., at its interface) spatially separated components of the SL period (e.g., indicative of layer thickness) from the conduction band in one layer (e.g., InAs) and another layer (e.g., InAsSb) The wavefunctions of the valence bands overlap in . By changing the crystal orientation of the substrate on which the SL layer is formed, rather than changing the SL period or the layer composition itself, the response of the photodetector can be changed without changing the physical properties of the SL.
[0025] In some embodiments, the present disclosure is dire...
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