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Long-wave infrared photodetector structures formed on high-index substrates

A photoelectric detector and long-wave infrared technology, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of reducing the absorption coefficient and increasing the operating wavelength of photodetectors, etc.

Pending Publication Date: 2021-12-17
IQE
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Typically, in the latter type, to increase the operating wavelength of the photodetector, an increased period of the superlattice (SL) is required, since absorption occurs at the interface of the SL where the wavefunctions overlap, so this can lead to an absorbing layer Absorption coefficient reduction per thickness unit or per single SL period of the material

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  • Long-wave infrared photodetector structures formed on high-index substrates
  • Long-wave infrared photodetector structures formed on high-index substrates
  • Long-wave infrared photodetector structures formed on high-index substrates

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[0024] The present disclosure is directed to layered structures including superlattices that can be used for photodetection. A superlattice comprises a periodic structure of layers (eg, alternating layers of two materials, each layer having a defined thickness). In some embodiments, photodetector operation is based on light absorption through direct phototransitions in a type II superlattice (SL). Absorption occurs between (e.g., at its interface) spatially separated components of the SL period (e.g., indicative of layer thickness) from the conduction band in one layer (e.g., InAs) and another layer (e.g., InAsSb) The wavefunctions of the valence bands overlap in . By changing the crystal orientation of the substrate on which the SL layer is formed, rather than changing the SL period or the layer composition itself, the response of the photodetector can be changed without changing the physical properties of the SL.

[0025] In some embodiments, the present disclosure is dire...

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Abstract

A layered structure used for detecting incident light includes a substrate having a surface with a high Miller index crystal orientation and a superlattice structure formed over the substrate at the surface. The superlattice structure is aligned to the high Miller index crystal orientation and exhibits a red-shifted long wave infrared response range based on the crystal orientation as compared to a superlattice structure formed over a substrate at a surface with a (100) crystal orientation.

Description

[0001] Cross References to Related Applications [0002] This disclosure claims the benefit of 35 U.S.C. §119(e) of U.S. Provisional Patent Application No. 62 / 832,639, filed April 11, 2019, which is hereby incorporated by reference in its entirety. Background technique [0003] Photodetectors typically provide an electronic signal indicative of incident light in some spectral range. For example, some photodetector architectures employ bulk layers to achieve optoelectronic behavior, while others include superlattice structures (SLS). Typically, in the latter type, to increase the operating wavelength of the photodetector, an increased period of the superlattice (SL) is required, since absorption occurs at the interface of the SL where the wavefunctions overlap, so this can lead to an absorbing layer The absorption coefficient per thickness unit or per single SL period of the material decreases. Contents of the invention [0004] The present disclosure is directed to layered...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/101H01L31/0304H01L31/0352H01L31/036
CPCH01L31/03046H01L31/035236H01L31/036H01L31/101H01L31/0304H01L31/1035
Inventor D·卢比夏夫J·M·法斯特诺A·W·K·刘M·V·卡特纳P·L·弗雷S·A·内尔森M·J·弗隆
Owner IQE
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