Automatic cleaning method and device of high-voltage discharge plasma source

A plasma source and automatic cleaning technology, applied in the direction of cleaning methods and appliances, separation methods, chemical instruments and methods, etc., can solve the problems of poor safety and low purification efficiency, and achieve the effect of safe and automatic cleaning treatment

Pending Publication Date: 2022-01-18
陕西青朗万城环保科技有限公司
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide an automatic cleaning method and device for a high-voltage discharge plasma source to solve the problem of low-temperature plasma waste gas treatment equipment in the prior art when processing VOCs. There are problems of low purification efficiency and poor safety

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  • Automatic cleaning method and device of high-voltage discharge plasma source
  • Automatic cleaning method and device of high-voltage discharge plasma source
  • Automatic cleaning method and device of high-voltage discharge plasma source

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Embodiment Construction

[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations.

[0031] Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art wi...

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Abstract

The invention provides an automatic cleaning method of a high-voltage discharge plasma source, and relates to the technical field of waste gas treatment. The method comprises the following steps: acquiring various parameters on a plasma source electrode, wherein the parameters comprise high voltage, plasma current and waste gas humidity; respectively judging the relationships between the high voltage, the plasma current and the waste gas humidity and the corresponding threshold values to obtain a judgment result; and performing induction heating on the plasma according to a judgment result. According to the invention, efficient, safe and reliable automatic cleaning treatment of the high-voltage discharge plasma source is realized.

Description

technical field [0001] The invention relates to the technical field of waste gas treatment, in particular to an automatic cleaning method and device for a high-voltage discharge plasma source. Background technique [0002] With the development of society and the improvement of human living standards, the environmental pollution caused by human activities is becoming more and more serious. The amount of VOCs emitted by human beings is also increasing year by year, seriously affecting people's health, and the pollution control of VOCs is urgent. [0003] As a high-tech treatment of VOCs, low-temperature plasma technology has attracted widespread attention due to its advantages such as low energy consumption, high efficiency, and simple equipment. (1) When the exhaust gas humidity is high, the discharge state on the electrode will change from glow discharge (plasma generation) to arc discharge, and the plasma generation rate will drop greatly. At the same time, the plasma curr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/32B01D53/44B08B7/00B08B13/00
CPCB01D53/323B01D53/44B08B7/0071B08B13/00B01D2257/708
Inventor 马中发王露阮俞颖
Owner 陕西青朗万城环保科技有限公司
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