Scanning photoetching control method and device, equipment and storage medium
A technology of lithography equipment and control method, applied in the field of lithography, can solve the problems of exposure image deviation, linear motor speed fluctuation, image mismatch, etc., and achieve the effect of reducing exposure image deviation and improving accuracy
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[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0040] figure 1 It is a schematic flowchart of a control method for scanning lithography provided by an embodiment of the present invention. This embodiment is applicable to situations where scanning lithography is required, and the method can be performed by a scanning lithography device, which can adopt implemented in software and / or hardware. ...
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