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Scanning photoetching control method and device, equipment and storage medium

A technology of lithography equipment and control method, applied in the field of lithography, can solve the problems of exposure image deviation, linear motor speed fluctuation, image mismatch, etc., and achieve the effect of reducing exposure image deviation and improving accuracy

Pending Publication Date: 2022-03-01
GIS TECH INC
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, due to the low precision of the motion system of scanning lithography, such as the speed fluctuation of the linear motor and the elastic error of the belt mechanism, these factors will cause the motion system to fail to output the corresponding frame image at the set point within the set time. As a result, some points do not correspond to the images of some frames during actual exposure, which makes the exposure image deviate

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  • Scanning photoetching control method and device, equipment and storage medium
  • Scanning photoetching control method and device, equipment and storage medium
  • Scanning photoetching control method and device, equipment and storage medium

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Embodiment Construction

[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0040] figure 1 It is a schematic flowchart of a control method for scanning lithography provided by an embodiment of the present invention. This embodiment is applicable to situations where scanning lithography is required, and the method can be performed by a scanning lithography device, which can adopt implemented in software and / or hardware. ...

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Abstract

The embodiment of the invention discloses a control method and device for scanning photoetching, equipment and a storage medium. The scanning photoetching control method comprises the following steps: acquiring a current position of a photoetching device moving to a target surface along a scanning direction; determining a current to-be-exposed light spot image according to the to-be-exposed image and the current position; and adjusting the light spot image projected to the target surface by the photoetching equipment according to the current light spot image to be exposed. According to the scheme, the light spot image of irradiating the target surface by the photoetching equipment is correspondingly adjusted by moving the photoetching equipment to the specific position of the target surface, so that compared with the prior art that the light spot image of projecting the target surface by the photoetching equipment is correspondingly adjusted through time, the problem that the precision of a scanning photoetching motion system is low is avoided; and deviation of the image exposed on the surface of the target is caused. Therefore, according to the scheme, the accuracy of the actual exposure point of scanning photoetching corresponding to the exposed frame image can be improved, and the exposure image deviation is reduced.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of lithography, and in particular, to a control method, device, equipment and storage medium for scanning lithography. Background technique [0002] At present, the displacement command issued by the scanning lithography system corresponds to the image command, that is, each point from point A to point B corresponds to each frame from M frame to N frame, and during the scanning lithography process It is based on time, for example, in scanning lithography movement, set time t to move to point C, and output L frames of images correspondingly. However, due to the low precision of the motion system of scanning lithography, such as the speed fluctuation of the linear motor and the elastic error of the belt mechanism, these factors will cause the motion system to fail to output the corresponding frame image at the set point within the set time. As a result, certain points do not correspond t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70491G03F7/70358
Inventor 陈国军吴景舟马迪
Owner GIS TECH INC