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Method and device for controlling parallelism of thin film in imprinting equipment

A technology of embossing equipment and a control method, which is applied in the field of thin film parallelism control and thin film parallelism control devices in embossing equipment, can solve the problem of low stability of thin film parallelism control, achieve the goal of eliminating cumulative errors and improving stability Effect

Pending Publication Date: 2022-03-08
TIANJIN EMBEDTEC
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  • Application Information

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Problems solved by technology

[0005] In order to solve the problem of low stability of film parallelism control in imprinting equipment in the current technical solution, this application proposes a film parallelism control method in imprinting equipment and a film parallelism control device in imprinting equipment

Method used

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  • Method and device for controlling parallelism of thin film in imprinting equipment
  • Method and device for controlling parallelism of thin film in imprinting equipment
  • Method and device for controlling parallelism of thin film in imprinting equipment

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Embodiment Construction

[0044] The following content is an example of the specific implementation process provided for the technical solution to be protected in this application in detail, but this application can also be implemented in other ways than the description here, and those skilled in the art can follow the guidelines of this application. Below, different technical means are used to realize the present application, so the present application is not limited by the following specific examples.

[0045] A method for controlling the parallelism of a thin film in an imprinting device provided by the present application includes: obtaining a deviation signal during the operation of the thin film as an input variable, and judging whether the systematic deviation in the deviation signal is less than a preset deviation threshold; Integrate the input variable within the preset time period, obtain the deviation control amount according to the integration result, and eliminate the deviation through the ...

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Abstract

The invention provides a film parallelism control method and device in imprinting equipment, and the method comprises the steps: obtaining a deviation signal in the operation process of a film as an input variable, and judging whether the system deviation in the deviation signal is smaller than a preset deviation threshold value or not; if yes, integrating the input variables in a preset time period, obtaining a deviation control quantity according to an integration result, and eliminating deviation through the deviation control quantity; if not, defining an input and output fuzzy set, and solving a fuzzy division table of the input and output variables according to the input and output fuzzy set; determining a fuzzy relation matrix according to the fuzzy division table and a preset fuzzy calculation rule; inputting the input variable into the fuzzy relation matrix, solving the fuzzy control quantity, and eliminating the deviation through the fuzzy control quantity and the deviation control quantity. Errors continuously generated in the operation process of the thin film are calculated through the fuzzy algorithm, accumulated errors caused by control quantity calculation through a mathematical formula are effectively eliminated, and parallelism control stability is improved.

Description

technical field [0001] The present application requests protection of an imprinting equipment control technology, in particular to a method for controlling the parallelism of a thin film in an imprinting equipment. The present application also relates to a film parallelism control device in an embossing device. Background technique [0002] Three-dimensional nano-film manufacturing belongs to the field of micro-nano manufacturing technology, and micro-nano manufacturing is one of the basic technologies of the modern manufacturing industry, and it is also an important frontier technology field that has attracted much attention. [0003] In the manufacturing process of the three-dimensional nano-film, the stability of the unwinding, running and winding process of the film substrate determines the continuous embossing quality of the three-dimensional nano-film; It is the key to determine the quality of embossing. During the movement of the film, in order to ensure that the po...

Claims

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Application Information

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IPC IPC(8): G05B11/42G03F7/00B29C59/04B29C37/00B82Y40/00
CPCG05B11/42G03F7/0002B29C59/046B29C37/00B82Y40/00B29C2037/90
Inventor 程晓亮刘炳坤刘海玲高臣
Owner TIANJIN EMBEDTEC
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