Focused ion beam sample cleaning method and device

A technology of focusing ion beam and cleaning device, which is applied in the directions of cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as inability to effectively clean focused ion beam samples, and achieve the effect of improving cleaning effect and improving picture quality.

Active Publication Date: 2022-03-18
YANGTZE MEMORY TECH CO LTD
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  • Abstract
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  • Claims
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Problems solved by technology

[0004] The invention provides a focused ion beam sample cleaning method and device, which is used to solve the problem that the prior art cannot effectively clean the focused ion beam sample, thereby improving the quality of TEM images

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  • Focused ion beam sample cleaning method and device
  • Focused ion beam sample cleaning method and device
  • Focused ion beam sample cleaning method and device

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Embodiment Construction

[0048] The specific implementation of the focused ion beam sample cleaning method and device provided by the present invention will be described in detail below in conjunction with the accompanying drawings.

[0049] At present, when low-voltage ion beams are used to clean impurities such as redeposits and amorphous layers on the surface of the focused ion beam, the angle caused by the sticky sample during the focused ion beam sample preparation process, such as the prepared focused ion beam sample and the grid The relationship between the grid fingers is not parallel or perpendicular to each other, so that part of the surface of the focused ion beam sample cannot be in contact with the ion beam during the cleaning process, so that it cannot be cleaned, which reduces the cleaning effect of the focused ion beam sample.

[0050] In order to improve the cleaning effect of focused ion beam samples, this specific embodiment provides a focused ion beam sample cleaning method, with f...

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Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to a focused ion beam sample cleaning method and device. The focused ion beam sample cleaning method comprises the following steps that a focused ion beam sample is inclined, so that the focused ion beam sample faces a transmission path of an ion beam, and a to-be-cleaned first surface in the focused ion beam sample is parallel to the transmission path; the focused ion beam sample is controlled to rotate by a first preset angle, so that the first surface faces the transmission path; and driving the ion beam to irradiate to the first surface along the transmission path so as to clean the first surface. According to the invention, the cleaning effect of the focused ion beam sample is improved, and the quality of a TME picture prepared by a focused ion beam process is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method and device for cleaning a focused ion beam sample. Background technique [0002] Focused Ion Beam (FIB) is to accelerate and focus the ion beam generated by the ion source on the surface of the sample. Focused ion beam sample preparation refers to the use of focused ion beams to directly cut thin film samples from the sample that can be studied by a transmission electron microscope (Transmission Electron Microscope, TEM) or other high-resolution electron microscopes. In the process of focused ion beam sample preparation, due to high-voltage grinding, an amorphous layer with a thickness of tens of nanometers will be formed on the side wall of the prepared sample. In addition, during the process of high-voltage grinding, re-deposition (Re-Deposition) will also be formed on the side wall of the sample. The amorphous layer and the redeposition will affe...

Claims

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Application Information

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IPC IPC(8): B08B7/00
CPCB08B7/0035
Inventor 王娅茹李威
Owner YANGTZE MEMORY TECH CO LTD
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