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Integrated circuit, method for manufacturing vertical transistor, and method for manufacturing integrated circuit

A technology of vertical transistors and integrated circuits, which can be used in the manufacture of circuits, electrical solid-state devices, semiconductor/solid-state devices, etc., and can solve problems such as damage

Pending Publication Date: 2022-03-29
MICRON TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Unfortunately, high temperatures can damage other structures on the wafer (eg, circuit components)

Method used

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  • Integrated circuit, method for manufacturing vertical transistor, and method for manufacturing integrated circuit
  • Integrated circuit, method for manufacturing vertical transistor, and method for manufacturing integrated circuit
  • Integrated circuit, method for manufacturing vertical transistor, and method for manufacturing integrated circuit

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Embodiment Construction

[0017] Embodiments of the invention encompass methods of forming integrated circuits including, for example, one or more vertical transistors, and integrated circuits independent of fabrication methods. Integrated circuits fabricated according to method embodiments may have any of the properties as described herein in structural embodiments. Any and all embodiments herein can be encompassed by a memory device (eg, a memory cell, an array of memory cells, etc.). refer to Figures 1 to 6 A first example method embodiment is described.

[0018] refer to figure 1 , the starting structure 10 in the manufacture of a vertical transistor comprises a base substrate 11 having (several) conductive / conducting / conducting, semiconducting / semiconducting / semiconducting or insulating / insulator / insulating (i.e., in this context neutrally electrically) any one or more of materials 12. Various materials have been formed vertically over base substrate 11 . materials are available at figure 1...

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PUM

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Abstract

The invention relates to an integrated circuit, a method for manufacturing a vertical transistor, and a method for manufacturing an integrated circuit. An integrated circuit includes an electronic component. Insulating silica is adjacent to the electronic component. The insulating silica has at least one of (a) and (b), wherein: (a): an average concentration of elemental form H of 0.002 to 0.5 atomic percent; and (b): an average concentration of elemental form N of 0.005 to 0.3 atomic percent. Other embodiments including methods are disclosed.

Description

technical field [0001] Embodiments disclosed herein relate to integrated circuits, methods for fabricating vertical transistors, and methods for fabricating integrated circuits. Background technique [0002] Memory is a type of integrated circuit and is used in computer systems to store data. Memory can be fabricated as one or more arrays of individual memory cells. Memory cells can be written to or accessed using digit lines (which may also be referred to as bit lines, data lines, or sense lines) and access lines (which may also be referred to as word lines, gate lines, or gate lines). read. Digit lines can conductively interconnect the memory cells along the columns of the array, and access lines can conductively interconnect the memory cells along the rows of the array. Each memory cell is uniquely addressable by a combination of digit and access lines. [0003] Memory cells may be volatile, semi-volatile, or non-volatile. Non-volatile memory cells can store data for...

Claims

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Application Information

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IPC IPC(8): H01L27/11509H01L21/3105H01L29/06H01L21/336
CPCH01L29/0653H01L21/3105H01L29/66742H10B53/40H01L21/02164H01L21/02282H01L21/02345H01L29/66666H01L29/6684H01L29/78391H10B51/30H01L29/66553H01L29/7827
Inventor M·R·拉斯卡尔J·B·赫尔刘鸿威
Owner MICRON TECH INC