Processing equipment and processing method of anti-dazzle glass

A processing equipment and anti-glare technology, applied in the field of anti-glare glass processing equipment, can solve the problems of flash point generation, poor uniformity of anti-glare surface particles, etc., and achieve the effect of reducing cleaning

Pending Publication Date: 2022-04-01
西实显示高新材料(沈阳)有限公司
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Based on the above-mentioned status quo, the main purpose of the present invention is to provide a processing equipment and processing method for anti-glare glass, to solve the problem of poor uniformity of particles on the anti-glare surface produced by existing processing equipment and to generate flash points

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Processing equipment and processing method of anti-dazzle glass
  • Processing equipment and processing method of anti-dazzle glass
  • Processing equipment and processing method of anti-dazzle glass

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0093] In the first embodiment, when two groups of process groups process the same surface to be processed of the same glass substrate to be processed, as Figure 6 As shown, in the first group 45 and the second group 46, the ion emission directions of the first plasma generating device 411 and the second plasma generating device 421 are oppositely arranged, that is, the first plasma generating device 411, the second plasma generating device 421 in the first group 45 The ion emission direction of the second plasma generation device 421 is toward the second group 46, and the ion emission directions of the first plasma generation device 411 and the second plasma generation device 421 in the second group 46 are toward the first group 45; The chamber 47 is equipped with a rotating table, which drives the carrier 10 to rotate, such as 180°, so as to enter the second group 46, and make the glass substrates to be processed face the same surface in the first group 45 and the second gro...

no. 2 example

[0094] In the second embodiment, when two groups of process groups 40 process different surfaces to be processed of the same glass substrate to be processed, as Figure 7 As shown, in the first group 45 and the second group 46, the ion emission directions of the first plasma generating device 411 and the second plasma generating device 421 are oppositely arranged; in this embodiment, the conversion chamber 47 is provided with a translation platform, and the translation platform The direction of translation is parallel to the side-by-side direction of the first group 45 and the second group 46, and perpendicular to the moving direction of the carrier 10, so as to drive the carrier 10 to move so as to enter the second group 46, and make the glass substrate to be processed on the carrier 10 In the first group 45 and the second group 46 , different surfaces face the plasma generating devices therein, that is, the surfaces to be processed facing the first plasma generating device 41...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses processing equipment and a processing method of anti-dazzle glass, the processing equipment comprises a feeding chamber, a feeding buffer chamber, a cleaning process chamber, a transition chamber, an etching process chamber, a discharging buffer chamber and a discharging chamber, the cleaning process chamber is provided with a first plasma generating device, the etching process chamber is provided with a second plasma generating device and a bias device, and the discharging buffer chamber is provided with a second plasma generating device. A to-be-processed glass substrate sequentially passes through a cleaning process chamber and an etching process chamber, in the cleaning process chamber, a cleaning gas source supplies gas to a first plasma generation device for work, and plasma cleaning is carried out on the to-be-processed glass substrate; and in the etching process chamber, the etching gas source supplies gas to the second plasma generation device, and meanwhile, the bias device works to carry out plasma etching on the glass substrate, so that the anti-glare surface is formed. The anti-dazzle glass can be manufactured by utilizing the glass substrate in a high-efficiency and pollution-free manner, and the anti-dazzle surface of the manufactured anti-dazzle glass is uniform in concave-convex structure and good in resolution.

Description

technical field [0001] The invention relates to the technical field of glass processing, in particular to processing equipment and a processing method for anti-glare glass. Background technique [0002] On the display screens of electronic devices such as drawing boards, electronic whiteboards, electronic blackboards, etc., if there is strong reflected light, it will cause interference to users and cause users to be unable to see the screen clearly. Therefore, it is often covered on the display screens of these electronic devices Glass cover made of anti-glare glass. Anti-glare glass is also called AG (Anti-glare glass) glass. Its principle is to change the flat reflective surface of glass into a rough surface by roughening the glass surface. The effect is to convert the mirror surface of the glass surface into The matte surface makes diffuse reflection of the light hitting the screen and reduces the intensity of reflected light, so as to achieve anti-glare effect, protect ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 邬文波赵成伟
Owner 西实显示高新材料(沈阳)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap