Grinding and polishing device for nanocrystalline strip production

A nanocrystalline strip, polishing device technology, applied in grinding/polishing safety devices, grinding/polishing equipment, surface polishing machine tools, etc., can solve the problem of poor adjustability, difficult nanocrystalline strip polishing and winding, Problems such as single function

Active Publication Date: 2022-04-08
朗峰新材料启东有限公司
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above situation, in order to overcome the defects of the prior art, the present invention provides a grinding and polishing device for the production of nanocrystalline strips that can automatically realize multiple functions when there is no power source, is easy to operate, energy-saving and environmentally friendly, and effectively solves the problem of Solved the problems that the grinding and polishing devices used for the production of nanocrystalline strips on the market have single functions, it is difficult to automatically realize the polishing and winding of nanocrystalline strips, it is difficult to automatically control the dust during operation, and the problems of poor adjustability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Grinding and polishing device for nanocrystalline strip production
  • Grinding and polishing device for nanocrystalline strip production
  • Grinding and polishing device for nanocrystalline strip production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them; based on The embodiments of the present invention and all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0036] In describing the present invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", " "Outside" and other indication orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implyi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a grinding and polishing device for nanocrystalline strip production. The grinding and polishing device comprises a self-service intermittent motion type dust control mechanism, a flexible passive polishing and rolling integrated mechanism, a sitting trigger type source supply mechanism, a main containing shell and supporting legs. The invention belongs to the field of nanocrystalline strip processing, and particularly relates to a grinding and polishing device for nanocrystalline strip production. The problems that at present, a grinding and polishing device for nanocrystalline strip production in the market is single in function, it is difficult to automatically achieve polishing and winding of nanocrystalline strips, it is difficult to automatically control dust during operation, and adjustability is poor are effectively solved.

Description

technical field [0001] The invention belongs to the technical field of processing nanocrystalline strips, and specifically refers to a grinding and polishing device for producing nanocrystalline strips. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical effects to reduce the surface roughness of the workpiece to obtain a bright and flat surface. It is a modification of the surface of the workpiece by using polishing tools and abrasive particles or other polishing media. During the production of nanocrystalline ribbons, grinding is required to make the surface smooth. [0003] The existing grinding and polishing devices for the production of nanocrystalline strips all use the existing polishing equipment to directly polish the nanocrystalline strips. In fact, the nanocrystalline strips are relatively light and thin, and direct processing operations using conventional polishing methods are likely to cause nanocrystalline strips...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/06B24B41/00B24B55/06B24B27/00B24B55/00B24B55/02
Inventor 江沐风吴登钱万云辉吉云飞
Owner 朗峰新材料启东有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products