A gas-liquid separation device for a multi-station single-chip wafer cleaning machine

A gas-liquid separation device, single-chip technology, applied in the direction of using liquid separation agent, separation method, and dispersed particle separation, can solve the problems of blocking the gas-liquid separation device, affecting the separation effect of waste gas and waste liquid, etc., to avoid crystallization Effect
CN114471037BActive Publication Date: 2022-07-01ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
Publication Date
2022-07-01

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Abstract

The invention provides a gas-liquid separation device for a multi-station single-chip wafer cleaning machine. The assembly is used to guide the waste gas and waste liquid inside the outer cavity to flow into the inner cavity. The top of the separation shell forms an exhaust pipe connecting the inner cavity to allow the exhaust gas to circulate in the inner cavity. At least one nozzle is embedded in the exhaust pipe, and the nozzle sprays The reaction liquid used to combine the atomized waste liquid particles in the exhaust gas circulating inside the exhaust pipe. The application realizes rapid gas-liquid separation of waste gas and waste liquid, and can combine and react the atomized waste liquid particles moving in the waste gas, so that the atomized waste liquid particles are dissolved in the waste liquid to obtain The recovery of the atomized waste liquid particles is realized, so that the atomized waste liquid particles can be fully discharged, so as to realize the removal of the atomized waste liquid particles and avoid the occurrence of crystallization in the chamber. Phenomenon.
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Description

technical field

[0001] The invention relates to the technical field of semiconductor equipment, in particular to a gas-liquid separation device for a multi-station single-chip wafer cleaning machine. Background technique

[0002] The single-wafer wafer cleaning machine will generate waste gas and waste liquid during the wafer cleaning process. In the prior art, an extraction device is usually used to extract and discharge the waste gas and waste liquid generated by the single-wafer wafer cleaning machine into the gas. In the liquid separation device, gas-liquid separation treatment is performed on waste gas and waste liquid. Such as the gas-liquid separation device disclosed in the prior art with publication number CN105161442A, it is difficult to quickly realize gas-liquid separation of waste gas and waste liquid, and it is difficult to remove the atomized waste liquid particles moving in the waste gas, resulting in It is difficult to fully discharge the atomized waste liq...

Claims

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