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A gas-liquid separation device for a multi-station single-chip wafer cleaning machine

A gas-liquid separation device, single-chip technology, applied in the direction of using liquid separation agent, separation method, and dispersed particle separation, can solve the problems of blocking the gas-liquid separation device, affecting the separation effect of waste gas and waste liquid, etc., to avoid crystallization Effect

Active Publication Date: 2022-07-01
ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Crystals will not only block the gas-liquid separation device, but also seriously affect the separation effect of the gas-liquid separation device on the subsequent waste gas and waste liquid

Method used

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  • A gas-liquid separation device for a multi-station single-chip wafer cleaning machine
  • A gas-liquid separation device for a multi-station single-chip wafer cleaning machine
  • A gas-liquid separation device for a multi-station single-chip wafer cleaning machine

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Embodiment Construction

[0029] The present invention will be described in detail below with reference to the various embodiments shown in the accompanying drawings, but it should be noted that these embodiments do not limit the present invention. Equivalent transformations or substitutions all fall within the protection scope of the present invention.

[0030] It should be understood that in this application, the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear" , "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", etc. indicate the orientation or position relationship as Based on the orientation or positional relationship shown in the drawings, it is only for the convenience of describing the technical solution and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orient...

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Abstract

The invention provides a gas-liquid separation device for a multi-station single-chip wafer cleaning machine. The assembly is used to guide the waste gas and waste liquid inside the outer cavity to flow into the inner cavity. The top of the separation shell forms an exhaust pipe connecting the inner cavity to allow the exhaust gas to circulate in the inner cavity. At least one nozzle is embedded in the exhaust pipe, and the nozzle sprays The reaction liquid used to combine the atomized waste liquid particles in the exhaust gas circulating inside the exhaust pipe. The application realizes rapid gas-liquid separation of waste gas and waste liquid, and can combine and react the atomized waste liquid particles moving in the waste gas, so that the atomized waste liquid particles are dissolved in the waste liquid to obtain The recovery of the atomized waste liquid particles is realized, so that the atomized waste liquid particles can be fully discharged, so as to realize the removal of the atomized waste liquid particles and avoid the occurrence of crystallization in the chamber. Phenomenon.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a gas-liquid separation device for a multi-station single-chip wafer cleaning machine. Background technique [0002] The single-wafer wafer cleaning machine will generate waste gas and waste liquid during the wafer cleaning process. In the prior art, an extraction device is usually used to extract and discharge the waste gas and waste liquid generated by the single-wafer wafer cleaning machine into the gas. In the liquid separation device, gas-liquid separation treatment is performed on waste gas and waste liquid. Such as the gas-liquid separation device disclosed in the prior art with publication number CN105161442A, it is difficult to quickly realize gas-liquid separation of waste gas and waste liquid, and it is difficult to remove the atomized waste liquid particles moving in the waste gas, resulting in It is difficult to fully discharge the atomized waste liq...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D47/06
CPCB01D47/06
Inventor 顾雪平时新宇
Owner ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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