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Abrasive cloth

A technology of abrasive cloth and non-woven fabric, which is applied in the field of abrasive cloth, and can solve problems such as hardness deviation, reduced flatness of the object to be ground, and excessive contact

Pending Publication Date: 2022-06-28
NITTA DUPONT INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, if the resin content is increased, local unevenness tends to occur at intervals of about 100 to 200 μm in the overall polishing cloth.
In particular, the unevenness caused by the longitudinal entanglement of the non-woven fabric will cause slight deviations in hardness, and as a result, local excessive contact will occur, which will reduce the flatness of the polished object.

Method used

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Examples

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Embodiment

[0069] Next, the present invention will be further described with reference to Examples and Comparative Examples.

[0070] Polishing cloths of Examples having physical properties shown in Tables 1 and 2 were produced. In addition, polishing cloths (commercial products) of comparative examples having physical properties shown in Tables 1 and 2 were prepared. In addition, the AsKer-C hardness, the compressibility, the apparent density of the forming material, the average value of the vertical abundance ratio of the 100 μm width of the forming material, and the interquartile range of the average value were measured by the above-mentioned method.

[0071] The flatness of the polishing cloth having a thickness of 1.2 to 1.3 mm and the polishing cloth having a thickness of 0.9 to 1.1 mm was evaluated by changing the conditions as follows.

[0072] Abrasive cloth with a thickness of 1.2 to 1.3 mm: Comparative Example 1, Examples 1 to 3

[0073] GBIR is measured based on the shape o...

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Abstract

The abrasive cloth according to the present invention comprises, as a forming material for forming the abrasive cloth, a non-woven fabric and a resin impregnated in the non-woven fabric, the AsKer-C hardness being 80 or more, and the quartile of the average value of the longitudinal abundance ratio of the 100 [mu] m width being 10.5 or less.

Description

[0001] Cross-referencing of related applications [0002] This application claims the priority of Japanese Patent Application No. 2020-215154, which is incorporated in the description of the specification of this application by reference. technical field [0003] The present invention relates to an abrasive cloth. Background technique [0004] An object to be polished such as a silicon wafer is polished using a polishing cloth (for example, Patent Document 1). The polishing cloth has a nonwoven fabric and a resin impregnated into the nonwoven fabric as a forming material for forming the polishing cloth. [0005] In such a polishing cloth, when the flexibility is too high, it is known that edge sagging occurs. Conventionally, by increasing the amount of resin impregnated to harden the polishing cloth, it is possible to reduce edge sagging by preventing excessive contact to the edge. [0006] prior art literature [0007] Patent Document 1: Japanese Patent Laid-Open No. 20...

Claims

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Application Information

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IPC IPC(8): D06N3/14
CPCD06N3/14B24D3/28B24D11/001
Inventor 川端丈山本惠司岳田考司
Owner NITTA DUPONT INC