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Ion loading system and ion loading method

A loading system and ion technology, applied in the field of ion trap quantum computing, can solve the problems of unfavorable ion trap quantum computer long-term work, atom reduction, etc., and achieve the effects of stable speed, extended service life and high work efficiency

Pending Publication Date: 2022-07-05
CHINAINSTRU & QUANTUMTECH (HEFEI) CO LTD
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AI Technical Summary

Problems solved by technology

[0003] In the process of evaporating atoms with pulsed light, during the long-term ablation process of the target, the position where the target is irradiated by the pulsed light will be depressed, which will lead to a great reduction of ejected atoms in further ablation. Facilitating long-term work of ion-trap quantum computers

Method used

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  • Ion loading system and ion loading method
  • Ion loading system and ion loading method
  • Ion loading system and ion loading method

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Embodiment Construction

[0037] The following describes in detail the embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary, only used to explain the present invention, and should not be construed as a limitation of the present invention.

[0038] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " Back, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Outer, Clockwise, Counterclockwise, Axial , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only f...

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Abstract

The invention discloses an ion loading system and an ion loading method. The ion loading system comprises a laser generator, an electric control scanner, a target material and an ion trap. The laser generator is suitable for emitting laser, the electric control scanner can enable a laser light path to deflect, the electric control scanner is suitable for changing the laser emitting direction, the target material ejects atoms at the ablation position under ablation of the ablation laser, and the ion trap is arranged adjacent to the target material and is suitable for collecting the atoms ejected by the target material. The electronic control scanner is arranged to change the position where the ablation laser irradiates the target material, the situation that the number of sprayed atoms is reduced due to the fact that the ablation laser ablates the same position of the target material for a long time and the target material is damaged and sunken is avoided, and therefore the service life of the target material can be prolonged, the number of generated ions is large, the speed is stable, and the efficiency is high. The working efficiency of the ion loading system is high.

Description

technical field [0001] The invention relates to the technical field of ion trap quantum computing, in particular to an ion loading system and an ion loading method. Background technique [0002] In the ion trap quantum computing system, ions are needed as carriers for bit storage and operation, so loading ions needs to be prepared in advance. The steps of loading ions are generally three steps: evaporation of atoms, ionization, cooling and trapping. The method of evaporating atoms is generally to ablate the target with high-energy pulsed light, and eject a large number of atoms at the ablation position. [0003] In the process of evaporating atoms with pulsed light, during the long-term ablation of the target material, the position of the target material irradiated by the pulsed light will be recessed, which will lead to a large reduction of ejected atoms in further ablation, which does not It is beneficial to the long-term work of ion trap quantum computers. SUMMARY OF T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/08
CPCG02B26/0816
Inventor 刘志超李岳
Owner CHINAINSTRU & QUANTUMTECH (HEFEI) CO LTD
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