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Compact atomization-assisted CVD (Chemical Vapor Deposition) film preparation device

A thin film preparation and compact technology is applied in the field of compact atomization-assisted CVD thin film preparation devices to achieve the effects of optimizing transport characteristics, regulating life, improving service life and working stability

Pending Publication Date: 2022-07-22
CHONGQING UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the current technical problems, the present invention provides a compact atomization-assisted CVD film preparation device to solve the problems in the prior art

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  • Compact atomization-assisted CVD (Chemical Vapor Deposition) film preparation device
  • Compact atomization-assisted CVD (Chemical Vapor Deposition) film preparation device
  • Compact atomization-assisted CVD (Chemical Vapor Deposition) film preparation device

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Embodiment Construction

[0026] The present invention will be further described in detail below in conjunction with test examples and specific embodiments. However, it should not be construed that the scope of the above-mentioned subject matter of the present invention is limited to the following embodiments, and all technologies realized based on the content of the present invention belong to the scope of the present invention.

[0027] In the description of the present invention, it should be understood that the terms "portrait", "horizontal", "upper", "lower", "front", "rear", "left", "right", "vertical", The orientations or positional relationships indicated by "horizontal", "top", "bottom", "inside", "outside", etc. are based on the orientations or positional relationships shown in the accompanying drawings, which are only for the convenience of describing the present invention and simplifying the description, rather than An indication or implication that the referred device or element must have ...

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Abstract

The invention discloses a compact atomization-assisted CVD (chemical vapor deposition) film preparation device which comprises a case, an atomization unit, a buffer cavity, a heating unit and a tail gas collecting unit are slidably arranged on the case, the atomization unit is communicated with the buffer cavity, one end of a quartz cavity is communicated with the buffer cavity, the other end of the quartz cavity is communicated with the tail gas collecting unit, and the heating unit is communicated with the tail gas collecting unit. A substrate sample is arranged in the quartz cavity, the quartz cavity penetrates through the heating unit and is heated by the heating unit, and a precursor solution enters the buffer cavity after being atomized by the atomization unit and enters the quartz cavity from the buffer cavity for film preparation. According to the scheme, the whole heating unit can move, the temperature gradient of the thin film deposition area in the quartz cavity in the vertical direction can be effectively changed, temperature field adjustability is achieved in the horizontal direction, and conditions are provided for exploring a thin film growth mechanism.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a compact atomization-assisted CVD thin film preparation device. Background technique [0002] CVD is the English abbreviation of chemical vapor deposition (Chemical Vapor Deposition, CVD), which is a general term for a large class of thin-film material growth technologies widely used in scientific research and production. According to different standards, such as working pressure, reaction temperature, physical field coupling type and method, equipment space layout, etc., CVD technology and equipment are classified into dozens of types. Due to the continuous deepening of theoretical and experimental research and the continuous accumulation of practical experience in production, CVD technology continues to enrich and mature along the path of innovation, improvement, re-innovation and re-improvement. In general, CVD technology presents a very active dynamic evolutio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/448C23C16/48C23C16/52C23C18/14
CPCC23C16/4486C23C16/4412C23C16/52C23C16/4411C23C16/482C23C18/143
Inventor 陈远豪梁昌兴罗月婷陈刚唐毅李翠龚恒翔肖黎
Owner CHONGQING UNIV OF TECH
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