Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ultraviolet lamp system and method

A technology of ultraviolet radiation and plasma lamp, applied in the field of ultraviolet lamp system, can solve problems such as reducing the life of plasma lamp, and achieve the effect of reducing microwave energy

Inactive Publication Date: 2006-06-21
NORDSON CORP
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The temperature increase corresponding to this excess infrared energy can significantly reduce the lifetime of the plasma lamp and produce additional, undesired effects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultraviolet lamp system and method
  • Ultraviolet lamp system and method
  • Ultraviolet lamp system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The invention relates to a microwave-excited UV lamp system configured to uniformly irradiate a substrate located in a microwave chamber processing space with UV radiation. In the present invention, the substrate is positioned in the process volume close to a microwave-excited plasma lamp to increase the intensity of the ultraviolet radiation. In addition, the present invention incorporates a reflector which is capable of providing relatively uniform illumination in a surrounding relationship with respect to the substrate - or around the substrate. In addition, the present invention separates the substrates with a UV transmissive conduit, which can supply fragile substrates and provide sufficient airflow to cool the microwave generator and plasma lamp. Additionally, the present invention allows substrates to enter the microwave chamber and travel through the process volume without actual leakage of microwaves from the chamber. In addition, the well-defined relative pos...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention discloses an ultraviolet radiation generating system and method for treating a coating on a substrate, such as a coating on an optical fiber cable. The system includes a microwave chamber having one or more access channels that allow substrates to move within, or through, the processing volume of the microwave chamber. A microwave generator is connected to the microwave chamber to excite a longitudinally extending plasma lamp installed in the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation to irradiate the substrate in the treatment volume. A reflector is installed in the processing space of the microwave chamber and is capable of reflecting the ultraviolet radiation to uniformly irradiate the substrate in a circumscribed manner. When the system is in operation, the microwave chamber is substantially sealed from the emission of microwave energy and ultraviolet radiation.

Description

technical field [0001] The present invention relates generally to ultraviolet lamp systems, and more particularly to microwave excited ultraviolet lamp systems configured to irradiate a substrate within a microwave chamber with ultraviolet radiation. Background technique [0002] UV lamp systems are commonly used to heat and cure materials such as adhesive coats, sealants, paints and coatings. Certain UV lamp systems have an electrodeless light source and operate by energizing an electrodeless plasma lamp with radio frequency energy or microwave energy. In an electrodeless UV lamp system that relies on microwave energy excitation, the electrodeless plasma lamp is mounted within a metallic microwave cavity—or chamber. One or more microwave generators are integrated inside the microwave chamber via waveguides. A microwave generator provides microwave energy to excite and maintain a plasma from a gas mixture enclosed within a plasma lamp. The plasma emits a specific spectrum...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B05D3/06H01J65/04F21V7/22G21K5/00A61N5/00B01J19/12B05C9/12B29C35/08C03C25/12C08J3/28G01J1/00G02B6/44G21K5/04G21K5/10H05H1/46
CPCH01J65/044
Inventor P·G·基奥J·W·施米特孔斯
Owner NORDSON CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com