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Vacuum negative pressure nanometer press printing method

A vacuum negative pressure and nano-imprinting technology, which is applied in optics, optomechanical equipment, instruments, etc., can solve the problems of difficult compensation, high manufacturing cost, and extremely high requirements for the consistency of piezoelectric crystals, so as to achieve easy control and reduce costs Effect

Inactive Publication Date: 2007-02-14
SHANGHAI JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this patented solution has extremely high requirements on the consistency of multiple piezoelectric crystals that apply top pressure compensation to the substrate, and requires the use of pressure sensors to monitor the top pressure compensation applied to piezoelectric crystals, otherwise it is very difficult to achieve uniform compensation
Therefore, the implemented system is complex and very expensive to manufacture

Method used

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  • Vacuum negative pressure nanometer press printing method
  • Vacuum negative pressure nanometer press printing method
  • Vacuum negative pressure nanometer press printing method

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] Such as figure 1 Shown, the present invention implements operation steps as follows:

[0024] The first step: open the upper cover 7 of the vacuum negative pressure studio 1,

[0025] Step 2: put the nanoimprinted substrate on the substrate workbench 10 on the polytetrafluoroethylene flexible spacer 9,

[0026] Step 3: Use a microdropper to drop the UV-sensitive glue onto the imprinted substrate,

[0027] Step 4: Adsorb the nano-imprint mold core to the surface of the pressure multiplier quartz plate 15 (using the plane vacuum adsorption between the back of the mold core and the surface of the quartz plate),

[0028] Step 5: Cover the upper cover 7 of the vacuum negative pressure studio,

[0029] Step 6: adjust the substrate table 10,

[0030] Step 7: Through the microscope through the circular quartz plate window 2 and the pressure multiplier quartz plate 15, observe the alignment, adjust the height of the substrate workbench 10 so that the nano-imprinting mold cor...

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Abstract

A vacuum negative pressure millimicron imprint method, concretely includes the following steps: (1) vacuum negative pressure generating method generates vacuum negative pressure through vacuum negative pressure chamber; (2) vacuum negative pressure transmitting method makes the vacuum of vacuum negative pressure chamber reach negative pressure; (3) vacuum negative pressure flexible transmitting method makes linkage through flexible hinge; (4) pressure multiplication method makes circular quartz slice combine together around the same center; (5) pressure carrying method makes two plates if model core and substrate carry balanced, average pressure vertical to the surface, by even polytetrafluoroethylene flexible cushion among screening substrate and work table, finishing the tight stitching technical course of millimicron imprint model core and substrate.

Description

technical field [0001] The invention relates to a nano-imprinting method used in the technical field of nano-processing technology, in particular to a vacuum negative pressure nano-imprinting method. Background technique [0002] Nanoimprint technology is a novel nanostructure pattern transfer technology, and it is one of the most promising nanofabrication techniques today. In nanoimprint exposure technology, graphics are transferred by pressing a stamp with a nano-concave-convex structure (nanoimprint core) onto a substrate with a thin polymer layer (nanoimprint substrate). The imprint assembly composed of the nano-imprint mold core and the nano-imprint substrate is heated or irradiated with ultraviolet light, and when the stamp is removed, the imprint of the original concave-convex nanostructure pattern is left on the substrate. These processes are performed in small, easy-to-operate and fully computer-controlled units, taking only a few minutes per substrate imprinting p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00H01L21/027
Inventor 王庆康段智勇
Owner SHANGHAI JIAOTONG UNIV