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Heating device

A heater and heat technology, applied in the direction of electric heating devices, electric furnace heating, ohmic resistance heating, etc., can solve the problems of poor ventilation efficiency, large-scale devices, and high device costs

Inactive Publication Date: 2007-04-18
ESPEC CORP
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  • Abstract
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  • Claims
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AI Technical Summary

Problems solved by technology

[0004] However, the problem with this device is that, in order to ventilate the heat treatment chamber 100 as a whole, the ventilating volume becomes large, and the mixed gas of the special gas G generated at the same time and the supply air is diffused and sucked into the intake passage 103, so , the ventilation efficiency of the special gas G is poor, and the heat loss increases with the increase of the ventilation volume. At the same time, it needs to suck in a large amount of air intake channels, which will increase the size of the heat treatment device and increase the cost of the device.
[0007] However, the IR heater with such a structure is also provided with an intake duct to exhaust the air in the heat treatment chamber as a whole. Therefore, similar to the device shown in (a), there are problems of increased heat loss, increased size of the device, and increased cost.

Method used

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Embodiment Construction

[0025] FIG. 1 shows the overall structure of a far-infrared radiation heater H (hereinafter referred to as "IR heater H") as a heating device of the present invention, and FIG. 2 shows a partial state of the IR heater H mounted on a heat treatment device. FIG. 3 shows an example of the schematic structure of the heat generating unit, and FIG. 4 shows an air supply system and an air intake system when the IR heater H is mounted and used in a heat treatment apparatus. The following will describe one by one with reference to other figures on the basis of FIG. 1 .

[0026] The IR heater H has a heat generating part 1, and as shown in FIG. 2, is placed opposite to a flat panel display (FPD) glass substrate W (hereinafter referred to as "substrate W") as a flat object, and is capable of uniform heating. The apparatus for heat treatment of the substrate W has, in this example, a gas supply channel 2 as a gas supply unit and an intake channel 3 as a gas intake unit. A radiator 7 comp...

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Abstract

An IR heater H which is a heating device is composed of a heat generation part 1 in which a resistance body is arranged between an insulation glass like a thin film and a protection glass so as to nip and hold it, an air feed passage 2 which is arranged to receive heat in the heat generation part 1 in a range opposing to a substrate W and in which air is supplied, an intake passage 3 arranged in the same way to suck the air containing sublimed gas or the like, many blow-out holes 21 and suction holes 31 distributed uniformly, and a heat radiation body 7 forming them, radiating heat by receiving heat in the heat generation part 1, and composed of an upper plate 4, an intermediate plate 5, and a lower plate 6. Since sublimed gas can be exhausted by feeding and sucking air by the IR heater only by only a narrowly-limited volume part between the IR heater and the substrate W when they are mounted in a heat treating device, exhaust efficiency is improved, a duct becomes unnecessary, and the heat treating device can be miniaturized.

Description

technical field [0001] The invention relates to a heating device for heat treatment which has a heat generating part and is arranged on the opposite side of a flat-shaped object that generates a special gas that should be removed due to heating, and can uniformly heat the object. It is especially suitable for LCD, organic The heat treatment process of photolithography treatment of photoresist is used in the manufacturing process of glass substrates for flat panel display (FPD) such as EL and PDP. Background technique [0002] In the heat treatment process of FPD glass substrates, etc., usually, IR heaters as far-infrared heaters are laminated and supported in multiple layers, and several substrates are placed between them, and the substrates are heated to a predetermined temperature by the IR heaters for heat treatment. At this time, when such a substrate is heated to a high temperature during the heat treatment process for photolithography, the sublimation gas or various so...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00H05B3/20F27B5/14F27B5/16F27D7/00F27D7/02F27D11/02
CPCA61F9/08G08G1/005
Inventor 田中秀树
Owner ESPEC CORP