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Chemical raw material dispensing system

A chemical raw material and a new type of technology, applied in gaseous chemical plating, chemical instruments and methods, and from chemically reactive gases, etc., can solve the problems of increasing equipment operation liquidity, many raw material distribution systems, and multiple raw material bottles

Inactive Publication Date: 2003-10-15
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Obviously, such a raw material distribution system, on the one hand, increases the equipment cost due to too many raw material distribution systems, and on the other hand, increases the working capital of the equipment operation because too many raw material bottles are needed

Method used

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  • Chemical raw material dispensing system
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  • Chemical raw material dispensing system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] see image 3 (The same parts of the present invention use the same reference numerals), wherein the raw material bottles 20, 20' are two or more, respectively have a pressure controller 30 connected to them, and the outlets of the raw material bottles 20 are respectively connected with two or more flow controllers The flow controllers 10 are respectively connected to a material growth chamber 40 . In a certain device, two channels of trimethylgallium and two channels of trimethylindium are required. The trimethylgallium raw material bottle 20 (the connection relationship between the raw material bottle 20 and the flow controller 10 and the pressure controller 30 is the same as the figure 2 Similarly), a downstream pressure controller 30 is used to deliver carrier gas (through piping) to the raw material bottle to control the pressure in the raw material bottle 20. In addition, the flow rate of the carrier gas output from the raw material bottle 20 is controlled by th...

Embodiment 2

[0045] see Figure 4 , wherein the raw material bottles 20, 20' are more than two, respectively have a pressure controller 30 connected to them, the outlet of the raw material bottle 20 is respectively connected with two or more flow controllers 10, and the flow controllers 10 are respectively connected to into more than two material growth chambers 40 . In a certain semiconductor manufacturing facility, there are two semiconductor material growth chambers 40 . Each growth chamber 40 requires one channel of trimethylgallium and one channel of trimethylindium. Among them, the trimethylgallium raw material bottle 20 uses a downstream pressure controller 30 (through a pipeline) to transport carrier gas into the raw material bottle to control the pressure in the trimethylgallium raw material bottle 20 . In addition, the flow rate controller 10 is used to control the flow rate of the carrier gas output from the trimethylgallium raw material bottle 20, and the two flow rate contro...

Embodiment 3

[0054] see Figure 5 , wherein the outlet of the raw material bottle 20 has a pressure gauge 50 , and the pressure gauge 50 controls the flow of the flow controller 10 . In a certain device, two channels of trimethylgallium are required. A flow controller (through a pipeline) is used to deliver the carrier gas to the trimethylgallium raw material bottle 20, and a pressure gauge 50 is used to measure the pressure in the raw material bottle on the outlet side of the raw material bottle. The pressure signal measured by the pressure gauge 50 is fed back to the flow controller 10. If the pressure in the raw material bottle is higher than a certain set value, the input of carrier gas into the raw material bottle is reduced or even stopped. If the pressure in the feed bottle is less than a set value, increase the flow rate of the input carrier gas into the feed bottle. The pressure in the raw material bottle is thus controlled. In addition, the flow controller controls the flow of...

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Abstract

The novel chemical material conveying system includes material bottle, pressure controller and flow rate controller, where the entrance of the material bottle is connected via pipeline with the pressure controller, the pressure controller has the other end connected via pipeline with the carrier gas entrance, the exit of the material bottle is connected via pipeline with several flow rate controller with the pipeline being inserted into the upper part of the material bottle, the other ends of the flow rate controller as material exits are connected via pipeline to different growing chambers.

Description

technical field [0001] The invention provides a novel distribution system for chemical raw materials, in particular to a material growth equipment that needs to use a carrier gas to transport raw materials. Background technique [0002] According to the type of material growth equipment, it includes metal-organic chemical vapor deposition (Metal-Organic Chemical Vapor Deposition, MOCVD for short, the same below), the equipment has another name: metal-organic chemical vapor deposition (Metal-Organic Vapor Phase Epitaxy, Referred to as MOVPE), it also includes chemical beam epitaxy (Chemical Beam Epitaxy, referred to as CBE, the same below) and any material growth equipment that requires a carrier gas to transport raw materials. [0003] According to the existing form of raw materials, it includes liquid raw materials, solid raw materials, etc. Commonly used liquid raw materials are: trimethyl gallium, triethyl gallium, trimethyl aluminum, triethyl aluminum, ethyl dimethyl in...

Claims

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Application Information

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IPC IPC(8): C23C16/455C30B25/14
Inventor 刘祥林
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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