High efficiency electroluminous device
A luminescence and device technology, applied in the field of organic light-emitting diode electroluminescence devices, can solve the problems of high driving voltage and devices without EL characteristics
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Embodiment 1
[0226] Example 1-EL Device Preparation-Example of the Invention
[0227] Sample Preparation and Testing
[0228] EL devices satisfying the requirements of the present invention and comparative examples in the form of Samples 1-2 were constructed in the following manner:
[0229] A glass substrate coated with an 85 nm layer of indium tin oxide (ITO) as the anode was then sonicated in a commercial detergent, rinsed in deionized water, degreased in toluene vapor and exposed to oxygen plasma for about 1 min.
[0230] a) To ITO, through CHF 3 1nm fluorocarbon (CF x ) hole injection layer (HIL).
[0231] b) Then a hole-transporting layer (HTL ), with a thickness of 75nm.
[0232] c) Then deposit three (8-quinolinolate) aluminum (III) (Inv-23, 0-99.5wt%), 9,10,11,12-tetraphenyltetracene on the hole transport layer 37.5-65.8 nm LEL composed of (Inv-16, 0-99.5 wt%) and emitter-electroluminescent component Inv-1, (0.27-0.50 wt%). These materials are also evaporated from the t...
Embodiment 2
[0242] Example 2 - EL device preparation - the embodiment of the present invention
[0243] Sample Preparation and Testing
[0244] An EL device satisfying the requirements of the present invention and a comparative example as Sample 4 were constructed in the following manner:
[0245] A glass substrate coated with an 85 nm layer of indium tin oxide (ITO) as the anode was then sonicated in a commercial detergent, rinsed in deionized water, degreased in toluene vapor and exposed to oxygen plasma for about 1 min.
[0246] a) To ITO, through CHF 3 1nm fluorocarbon (CF x ) hole injection layer (HIL).
[0247] b) Then a hole-transporting layer (HTL ), with a thickness of 75nm.
[0248]c) Then deposit three (8-quinolinolate) aluminum (III) (Inv-23, 0-99.5wt%), 9,10,11,12-tetraphenyltetracene on the hole transport layer 37.5-67.2 nm LEL composed of (Inv-16, 0-99.5 wt%) and emitter-electroluminescent component Inv-1, (0.30-0.50 wt%). These materials are also evaporated from...
Embodiment 3
[0256] Example 3 - EL device preparation - the embodiment of the present invention
[0257] Sample Preparation and Testing
[0258] EL devices satisfying the requirements of the present invention and comparative examples serving as samples 5-8 were constructed in the following manner:
[0259] A glass substrate coated with an 85 nm layer of indium tin oxide (ITO) as the anode was then sonicated in a commercial detergent, rinsed in deionized water, degreased in toluene vapor and exposed to oxygen plasma for about 1 min.
[0260] a) To ITO, through CHF 3 1nm fluorocarbon (CF x ) hole injection layer (HIL).
[0261] b) Then a hole-transporting layer (HTL ), with a thickness of 75nm.
[0262] c) Then deposit three (8-quinolinolate) aluminum (III) (Inv-23, 0-99.5wt%), 9,10,11,12-tetraphenyltetracene on the hole transport layer 37.5-74.3 nm LEL composed of (Inv-16, 0-99.5 wt%) and emitter-electroluminescent component Inv-1, (0.30-0.50 wt%). These materials are also evapor...
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