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Whirlpool-type reaction chamber poison gas processing apparatus and method

A technology of toxic gas and treatment method, applied in the direction of combustion method, combustion type, incinerator, etc., can solve the problems of reducing equipment life and increasing enterprise cost, etc.

Inactive Publication Date: 2005-02-16
DESICCANT TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] The products of all exhaust gas reactions are gases, except SiO produced after SiH cracking 2 Solids are easily adsorbed on the inner wall of the reactor. In order to maintain the performance of the reactor, the inner wall needs to be cleaned more frequently, so it has the disadvantages of reducing the life of the equipment and increasing the cost of the enterprise.

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  • Whirlpool-type reaction chamber poison gas processing apparatus and method
  • Whirlpool-type reaction chamber poison gas processing apparatus and method
  • Whirlpool-type reaction chamber poison gas processing apparatus and method

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Embodiment Construction

[0066] The present invention can be applied in the factory to process the waste gas of perfluorinated compounds (PFCs), introducing gas to form a vortex flow to clean the products that will adhere to the inner wall of the reaction chamber during the process of burning the perfluorinated compounds (PFCs).

[0067] see figure 2 , is the toxic gas waste gas combustion furnace incineration treatment device of the present invention. The same as the incineration treatment of general waste gas incinerators, the waste gas is firstly introduced and mixed with plasma directly, and then enters the reaction chamber for treatment. After the water unit cools down, it is introduced into a wet scrubber for treatment and then discharged, and the circulating water of this wet scrubber is supplied by a water tank. The difference is: the treatment device of the present invention introduces gas during the treatment process, and the force generated by the velocity field generated by the gas scrub...

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Abstract

This invention provides a swirl reaction cavity poisonous gas processing device and a method, among which, the gas enters into the reaction cavity in tangent direction, so that, the distribution of generated speed field has the function of washing the inside wall of the reactor and its following channel to reduce stacking of small molecule solids on its inside wall in splitting to further prolong time of routine washing needed by the reactor, beside, this invention divides the post water channel set into a first and a second parts so as to bring out all small molecules suspending on water surface in the set effectively.

Description

technical field [0001] The present invention relates to a toxic gas treatment device and method in a vortex reaction chamber, in particular to a method of washing the inner wall of the reactor, which can introduce gas into the reaction chamber without external force, so as to reduce the toxic gas in the cracking process The generated small molecular solids accumulate on the inner wall of the reactor, thereby prolonging the time for which the reactor needs to be cleaned regularly. Background technique [0002] All gases are one of the greenhouse control gases, among which SF 6 , HFCs and PFCs are mainly man-made greenhouse gas components. Although HFCs and PFCs do not deplete the ozone layer, they are both potent greenhouse gases. Their high Global Warming Potential (GWP) is a thousand times higher than that of carbon dioxide, and they can stay in the atmosphere for a long time. Long lifetime, cumulative effect in the atmosphere is irreversible. In recent years, semiconduc...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F23G7/08
Inventor 郑石治
Owner DESICCANT TECH CORP