Polarizing film mask slice with high resolution

Abstract

A polarized film high resolution mask plate characterizes in covering a layer of polarized film on a relevant zone of the mask to enable the transmission zone adjacent an non-transmission zone to transmit line polarized imaging beams with mutual vertical polarization directions (or inversed rotation round polarization imaging beams, or those elliptical inversed rotation and mutual vertical major axis) to integrate the polarization film and traditional mask plate to enable the mask plate itself to have the function of output polarized light to increase the basic period of mask pattern and reduce the diffraction angle of imaging beams and adjacent effect to increase photo-etching resolution used in deep sub-micron and nm projecting lithography.

Description

Technical field [0001] The invention is a novel polarizing film high-resolution mask plate, which belongs to the further optimization and improvement of the structure of the mask plate in the projection optical lithography system. Background technique [0002] The schematic diagram of the traditional mask structure is as follows: figure 1 As shown, the light-transmitting regions 8 and the opaque regions 9 are alternately arranged to form a mask pattern, and the corresponding mask amplitude transmittance is as follows: figure 1 as shown in c. [0003] In recent years, in order to improve the resolution of projection optical lithography, a phase-shift layer that changes the phase of the imaging beam has been designed in a specific area of ​​the mask plate for light transmission. There are many types of such phase-shift masks. figure 2 What is shown is a schematic structural diagram of a phase shift mask. There is a phase shift layer at the light-transmitting region 11 , an...

AI Technical Summary

Problems solved by technology

The application of phase-shift mask technology has improved the resolution to some extent, but with the reduction of the basic period of the lithography line, the phase-shift mask cannot guarantee high-quality imaging; and the design of the optimal phase shifter, The location is difficult to place, the manufacturing cost is high, and the above-mentioned deficiencies are difficult to meet the needs

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