Etching composition
A composition and etching technology, used in clamping, supporting, positioning devices, etc., can solve the problems of Mo series being affected, ferric chloride being unstable, and being easily decomposed by hydrochloric acid.
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Embodiment 1
[0039] 12% by mass of hydrochloric acid, 3% by mass of acetic acid, 0.1% by mass of NH as additives 4 NO 3 and the rest of the ultrapure water were evenly mixed to produce an etching composition.
Embodiment 2~4 and comparative example 1~4
[0041] An etching composition was produced in the same manner as in Example 1 except that the composition was shown in Table 1 below.
[0042] Form a transparent conductive film (ITO film) by sputtering on a glass substrate, coat a photoresist and develop it, and fix the etching compositions of the above-mentioned Examples 1 to 4 and Comparative Examples 1 to 4 at 45° C. After the patterned test piece was dipped for 90 seconds, the measured etching performance results are shown in Table 1 below. The unit in Table 1 is % by weight.
[0043] [Table 1]
[0044]
[0045] It can be seen from Table 1 that, compared with Comparative Examples 1-4, the descum removal efficiency of the etching compositions in Examples 1-4 produced by the present invention is better.
Embodiment 5~13
[0047] As shown in Table 2 below, when 15% by mass of hydrochloric acid, 5% by mass of acetic acid, and 1.0% by mass of NH 4 NO 3 In the etching composition composed of the remaining amount of ultrapure water, ammonium perfluorooctane sulfonate is used as a fluorine-based anionic surfactant, and 0ppm, 50ppm, 100ppm, 300ppm, 500ppm, and 1000ppm are added respectively, and uniformly mixed to form an etching composition things. The unit in Table 2 is % by weight.
[0048] [Table 2]
[0049]
[0050] Table 3 shows the results of measuring the scum removal efficiency with the change of surfactant concentration using the etching compositions obtained in Example 5, Example 8, and Examples 10 to 13 above.
[0051] [table 3]
[0052]
[0053] It can be seen from Table 3 that when a surfactant is added to the etching composition produced by the present invention, better scum removal effect can be obtained. Especially when the concentration of the surfactant is in the range of...
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