Measurer of dielectric film microwave complex dielectric permittivity

A technology of complex permittivity and dielectric thin film, which is applied in measuring devices, measuring electrical variables, measuring resistance/reactance/impedance, etc., can solve the problems of large measurement errors and the inability to realize the dielectric thin film microwave complex permittivity, and achieve high Sensitivity, the effect of precise measuring devices

Inactive Publication Date: 2006-09-20
ZHEJIANG UNIV
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Problems solved by technology

This method provides an alternative solution for the measurement of the microwave complex permittivity of solid dielectrics that can be machined and formed. However, its biggest disadvantage is that the thickness of the sample needs to be on the order of millimeters. level, the measurement error of this method is very large
[0005] Although there...

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  • Measurer of dielectric film microwave complex dielectric permittivity
  • Measurer of dielectric film microwave complex dielectric permittivity
  • Measurer of dielectric film microwave complex dielectric permittivity

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Embodiment

[0028] A device for measuring the microwave complex permittivity of dielectric thin films. The metal resonant cavity 5 is made of a standard rectangular waveguide model 153IEC-R32, and the width a, height b, and length l are 72.14mm, 34.04mm, and 138.52mm respectively. mm, there are 10mm long and 0.5mm wide thin grooves 4 in the middle of the upper and lower planes of the resonant cavity respectively; the dielectric substrate 8 is made of quartz material, and its thickness is d 0 and width l 0 0.46mm and 9.89mm respectively; the model of network analyzer 1 is Agilent 8714ET, which is connected to the rectangular metal resonator 5 through a ring coupler, and the measured dielectric film is MC-91[BaO-(SmNdLa) 2 o 3 -Bi 2 o 3 -TiO 2 ] dielectric ceramic thin film, its thickness Δd is measured by α step meter, and is 810nm, according to the steps of the present invention, adjust the frequency range and the amplitude scale of the network analyzer to an appropriate value, and ca...

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Abstract

This invention relates to testing equipment of nm order thickness medium thin film microwave complex dielectric permittivity. It includes resonant cavity, net analyzer and medium substrate. Radiofrequency interconnection devices are set on both ends of the cavity, through hole is set in middle part, the substrate is used to burdening medium thin film, the through hole can be through in it and its two ends are out of the cavity. The input and output ends of the analyzer are connected to the two couplers of the cavity. Substrate coated and uncoated can be separately inserted into the through holes of the cavity to get two groups of resonance frequency and quality factor value. Then the medium thin film complex dielectric permittivity can be got by the two data combined with the cavity, substrate and rectangular protractor of the film. The permittivity includes real part and loss angle tangent. So this invention is a general, precision testing device of medium thin film microwave complex dielectric permittivity.

Description

technical field [0001] The invention relates to a measuring device for microwave complex permittivity, in particular to a measuring device for microwave complex permittivity of a dielectric film whose thickness is in the order of microns. Background technique [0002] Thin film and integration are the development trend of radio frequency microwave devices. Accurately measuring the microwave complex permittivity of materials is one of the keys to accurately design microwave devices. So far, although there have been national standards for the measurement of microwave complex permittivity of bulk materials (GB5597-85, etc.), but for It is still an unsolved problem to measure the microwave complex permittivity of thin-film materials whose thickness is on the order of micrometers. [0003] The complex permittivity is defined as ε%=ε 0 ·ε r =ε 0 ·(ε r '-jε r ") = ε 0 ·ε r ′(1-jtanδ), where ε 0 is the dielectric constant in vacuum, its value is 8.854×10 -12 F / m, ε r is t...

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Application Information

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IPC IPC(8): G01R27/26
Inventor 王德苗金浩董树荣谢银芳
Owner ZHEJIANG UNIV
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