Measurer of dielectric film microwave complex dielectric permittivity
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- ZHEJIANG UNIV
- Publication Date
- 2006-09-20
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a measuring device for microwave complex permittivity, in particular to a measuring device for microwave complex permittivity of a dielectric film whose thickness is in the order of microns. Background technique
[0002] Thin film and integration are the development trend of radio frequency microwave devices. Accurately measuring the microwave complex permittivity of materials is one of the keys to accurately design microwave devices. So far, although there have been national standards for the measurement of microwave complex permittivity of bulk materials (GB5597-85, etc.), but for It is still an unsolved problem to measure the microwave complex permittivity of thin-film materials whose thickness is on the order of micrometers.
[0003] The complex permittivity is defined as ε%=ε 0 ·ε r =ε 0 ·(ε r '-jε r ") = ε 0 ·ε r ′(1-jtanδ), where ε 0 is the dielectric constant in vacuum, its value is 8.854×10 -12 F / m, ε r is t...