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Liquid flow control system for wet processing tank, and wet processing system

A liquid flow and control system technology, applied in the direction of flow control, control/regulation system, non-electric variable control, etc.

Active Publication Date: 2006-12-27
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above programmable logic controller is to generate an operation signal

Method used

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  • Liquid flow control system for wet processing tank, and wet processing system
  • Liquid flow control system for wet processing tank, and wet processing system
  • Liquid flow control system for wet processing tank, and wet processing system

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Embodiment Construction

[0025] In order to make the purpose, features and advantages of the present invention more obvious and understandable, the preferred embodiments are specially cited below, together with the attached drawings Figure 2 to Figure 5 , give a detailed explanation. The description of the present invention provides different examples to illustrate the technical features of different implementations of the present invention. Wherein, the configuration of each element in the embodiment is for illustration, not for limiting the present invention. In addition, part of the symbols in the figures in the embodiments are repeated for the purpose of simplifying the description, and do not imply the relationship between different embodiments.

[0026] figure 2 A schematic diagram of a manufacturing system according to an embodiment of the invention is shown. The manufacturing system 200 performs a wet process on a semiconductor wafer. Manufacturing system 200 includes wet process system ...

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Abstract

The provided liquid flow control system for a wet process groove comprises: a PLC to generate an operation signal, a pneumatic valve to control the groove flow as the command, and a valve monitor coupled with last two parts to monitor the valve position. This invention is fit to real-time detection.

Description

technical field [0001] The present invention relates to semiconductor manufacturing, and more particularly to systems and methods for detecting whether wet process tank circulation valves are functioning properly. Background technique [0002] Wet chemical etching is widely used in semiconductor manufacturing, and is used in many discrete components or large-scale integrated circuits. In the semiconductor industry, the wet process has various process applications, such as: photoresist stripping, and silicon nitride and silicon oxide removal. Generally, the hard equipment for wet etching includes a plurality of processing tanks for mainetch process, intermediary washer, rinse, and dryer. [0003] figure 1 A cross-sectional view showing an existing wet etch bath. A conventional wet etching tank includes: an inner tank 10 , an outer tank 12 , return pipes 14 a and 14 b , drain pipes 16 a and 16 b , control valves 171 , 173 , and 175 , a pump 18 , and a filter 19 . [0004] ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/306H01L21/311H01L21/3213C23F1/00G05D7/00
Inventor 蔡博涛
Owner TAIWAN SEMICON MFG CO LTD