Conveying chamber, substrate processing device, and substrate disorder detection method

A technology of a conveying device and a detection method, which is applied in the field of a conveying room, and can solve problems such as difficult detection and inability to apply position deviation detection of glass substrates

Inactive Publication Date: 2007-03-14
TOKYO ELECTRON LTD
View PDF1 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The misalignment detection device of Patent Document 1 is aimed at small circular semiconductor wafers, and cannot be applied to misalignment detection of large rectangular glass substrates for FPDs.
In addition, the positional displacement detection device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Conveying chamber, substrate processing device, and substrate disorder detection method
  • Conveying chamber, substrate processing device, and substrate disorder detection method
  • Conveying chamber, substrate processing device, and substrate disorder detection method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] Next, preferred embodiments of the present invention will be described with reference to the drawings. Here, as a substrate processing apparatus, in a transfer chamber used in a multi-chamber plasma processing apparatus for performing plasma processing on a glass substrate for FPD (hereinafter simply referred to as a “substrate”) S, the substrate is abnormally treated. An example of detection will be described. Here, the FPD includes, for example, a liquid crystal display (LCD), a light emitting diode (LED) display, an electroluminescence (Electro Luminescence, EL) display, a fluorescent display tube (Vacuum Fluorescent Display, VFD), a plasma display panel (PDP), etc. .

[0043] FIG. 1 is a perspective view schematically showing a plasma processing apparatus according to one embodiment of the substrate processing apparatus of the present invention, and FIG. 2 is a horizontal cross-sectional view schematically showing its interior.

[0044] In this vacuum processing a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a substrate processing apparatus in which such a fault as misregistration or chipping of a large FPD substrate in a conveyance chamber can be detected certainly, and to provide a method for detecting the fault of the substrate. When a substrate (S) is mounted on the slide pick (513) of a conveying device and carried into a process chamber from the interior of a conveyance chamber (20) through a gate opening (22d), the substrate (S) is irradiated with light beams at the parts in the vicinity of the opposite ends shown by dashed lines (A, B) by means of a pair of sensors (70, 70) arranged on the right and left, and misregistration or defect of the substrate S is detected by its reflectivity or transmissivity.

Description

technical field [0001] The present invention relates to a transfer chamber, a substrate processing apparatus, and a substrate abnormality detection method, for example, to a transfer chamber of a substrate processing apparatus for performing etching or other processing on a glass substrate for a flat panel display (FPD), a substrate processing apparatus having the transfer chamber, And detection methods for substrate abnormalities such as substrate misalignment and chipping. Background technique [0002] In the manufacturing process of flat panel displays (FPDs) represented by liquid crystal displays (LCDs), a plurality of vacuum processing devices that perform predetermined processes such as etching, ashing, and film formation on glass substrates under vacuum are used. So-called multi-chamber type vacuum processing system. [0003] Such a vacuum processing system has a transfer chamber provided with a transfer device for transferring substrates, and a plurality of processi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L21/677H01L21/67H01L21/66B65G49/06G01D5/34
CPCG02F1/1309H01L21/683
Inventor 冈部星儿末木英人
Owner TOKYO ELECTRON LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap