Method and system for detecting corrugation defect and manufacturing method of photomask

A technology of defect inspection and photomask, which is applied in the photolithographic process of patterned surface, optical testing for flaws/defects, and originals for photomechanical processing, etc. It can solve the problems of inability to detect ripple defects and changes with high precision

Inactive Publication Date: 2007-06-20
HOYA CORP
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Problems solved by technology

However, in the mura defect inspection device described in Patent Document 1, the inspection conditions of the mura defect inspection are not changed according to the pattern information of the repeated pattern to be inspected, and as a result, the mura defect cannot be detected with high accuracy.

Method used

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  • Method and system for detecting corrugation defect and manufacturing method of photomask
  • Method and system for detecting corrugation defect and manufacturing method of photomask
  • Method and system for detecting corrugation defect and manufacturing method of photomask

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Embodiment Construction

[0024] Next, preferred modes for implementing the present invention will be described with reference to the drawings.

[0025] FIG. 1 is a system configuration diagram showing an embodiment of a mura defect inspection system of the present invention. FIG. 4 is a perspective view showing a state of inspecting a mura defect by the mura defect inspection apparatus in FIG. 1 .

[0026] The moire defect inspection system 30 shown in FIG. 1 is a system for detecting a moire defect generated in a repeated pattern 51 ( FIG. 5 ) formed on the surface of a photomask 50 as an object to be inspected, and is configured to have a pattern information acquisition unit as a pattern information acquisition unit. The pattern information acquisition device 20 of the above-mentioned, and the moire defect inspection device 10 as the moire defect inspection unit. The photomask 50 described above is an exposure mask used for manufacturing a video device.

[0027] Here, the video device is, for exam...

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Abstract

An irregular flaw inspection method and system, and a fabricating method of a photomask are provided. The subject of the invention is to provide an irregular flaw inspection method capable of efficiently inspect an irregular flaw with high precision. In the irregular flaw inspection method for inspecting the irregular flaw produced in the repeating pattern of a photomask (50) having the repeating pattern wherein a large number of unit patterns are arranged regularly, a region having the repeating pattern becoming the inspection target of the irregular flaw is designated as an inspection area from the whole image of the photomask taken by the imaging camera (21) of a pattern data acquiring device (20) and the pattern data of the repeating pattern is acquired from the image, which is taken by a microscope (22), of the repeating pattern in the inspection area. The inspection condition of the irregular flaw due to an irregular flaw inspection device (10) is determined on the basis of the pattern data and the inspection of the irregular flaw is performed on the basis of the inspection condition by the irregular flaw inspection device.

Description

technical field [0001] The present invention relates to a mura defect inspection method and system for detecting a mura defect of a pattern in a video device, or a mura defect of a photomask used for manufacturing a video device, and a method for manufacturing a photomask. Background technique [0002] Conventionally, in the manufacture of video devices such as imaging devices and display devices, or photomasks for manufacturing them, moiré defect inspection is an inspection item for patterns formed on the surface. Moire defects refer to the unexpected errors of different regularities in regularly arranged graphics, which are caused by various reasons in the manufacturing process. [0003] In imaging devices and display devices, if moiré defects exist, sensitivity unevenness and display unevenness may occur, possibly deteriorating the performance of the device. In photomasks used in the manufacture of imaging devices and display devices, if moiré defects occur in the patter...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/20G01B11/24G01M11/00G01N21/956G03F1/84
CPCG01N21/956G01N2021/95676G01N21/88G02F1/13
Inventor 吉田辉昭
Owner HOYA CORP
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