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Implanting method and apparatus

a technology of substrate and rotary plate, applied in the direction of electrical apparatus, instruments, basic electric elements, etc., can solve the problems of time-consuming and expensive process

Active Publication Date: 2022-05-24
XIA TAI XIN SEMICON QING DAO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent describes a device for implanting ions onto a substrate with two transistors arranged perpendicular to each other. The device includes an ion source, a chuck for holding the substrate, and an analyzer for measuring the rotational displacement of the substrate. There is also a stepper motor connected to the chuck to rotate the substrate. The stepper motor takes a certain number of steps to complete a full rotation when the substrate is not moving and takes more steps when the substrate is moving. The technical effect of this device is to enable more precise and accurate ion implantation during the manufacturing process of semiconductor devices.

Problems solved by technology

This is an expensive and time-consuming process.

Method used

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  • Implanting method and apparatus
  • Implanting method and apparatus

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Embodiment Construction

[0009]The present disclosure will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the disclosure are shown. This disclosure may, however, be embodied in many different forms and should not be construed as limited to the exemplary embodiments set forth herein. Rather, these exemplary embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. Like reference numerals refer to like elements throughout.

[0010]The terminology used herein is for the purpose of describing particular exemplary embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and / or “comprising,” or “includes” and / or “including” or...

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Abstract

The instant disclosure includes an implanting apparatus and a method thereof. The implanting apparatus has a chuck configured to carry a substrate is rotated a number of times at an angle during ion implantation. In this way, masks used during semiconductor fabrication is reduced.

Description

CROSS-REFERENCES TO RELATED APPLICATIONS[0001]This application claims the benefit of U.S. Provisional Patent Application No. 62779520 filed on Dec. 14, 2018, which is hereby incorporated by reference herein and made a part of specification.BACKGROUND1. Field[0002]The present disclosure generally relates to implanting method and apparatus, and more particularly, implanting method and apparatus for rotating substrate to eliminate masking processes.2. Related Art[0003]In order to provide analog field effect transistor (FET) and digital FET doping profiles that are independent of one another, one must selectively cover (typically with photo-resist) the first set of devices, e.g. the analog FETs, while performing extension and halo ion implantations for the second set, e.g. the digital FETs, and then, remove the covering resist, cover the second set of devices, e.g. the digital FETs, selectively, and perform the extension and halo ion implantations for the first set of devices. This is a...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): G03F7/30H01L21/425H01L21/308G03F7/20
CPCG03F7/3021H01L21/3086H01L21/425G03F7/2063H01L21/265H01J37/3171H01L21/823418H01L21/26586H01L27/088H01J2237/20214H01J2237/31701
Inventor CHOI, JONG-MOOKIM, SUNG-KI
Owner XIA TAI XIN SEMICON QING DAO LTD