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Polishing composition for magnetic disk

a technology of polishing composition and magnetic disk, which is applied in the direction of lapping machines, manufacturing tools, other chemical processes, etc., can solve the problems that the polishing composition cannot be said to be satisfactory, and the approach from these polishing compositions cannot be satisfactory

Inactive Publication Date: 2005-02-10
KAO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention is about a polishing composition for magnetic disks that contains alumina, water, a peroxide, and an organic acid. The invention also includes a polishing process for substrates using this composition and a method for manufacturing substrates by polishing them with this composition. The technical effect of this invention is to provide a polishing composition that can effectively polish magnetic disks and substrates, resulting in high-quality products.

Problems solved by technology

However, although the mechanical conditions as mentioned above have some effects, they cannot be said to be satisfactory.
However, the approaches from these polishing compositions cannot be satisfactory from the viewpoint of satisfying both the polishing rate and reduction in waviness necessary for practical use, and also the prevention of surface stains.

Method used

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Examples

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Comparison scheme
Effect test

examples

The following examples further describe and demonstrate embodiments of the present invention. The examples are given solely for the purposes of illustration and are not to be construed as limitations of the present invention.

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Abstract

A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like.

Description

FIELD OF THE INVENTION The present invention relates to a polishing composition for a magnetic disk, a polishing process with the polishing composition, and a method for manufacturing a substrate with the polishing composition. BACKGROUND OF THE INVENTION In order to have a smaller unit recording area and promote higher storage capacity for hard disk drives, it has been desired to lower the flying height of the magnetic head and prevent surface defects (surface stains). In order to lower the flying height of the magnetic head, there have been earnestly desired a reduction of short-wavelength waviness (waviness having a wavelength of 50 to 500 μm) and a reduction of long-wavelength waviness (waviness having a wavelength of 0.5 mm or more), and prevention of residual substances on the surface during the polishing step of the hard disk substrate. The “waviness” as used herein refers to dents and projections of a surface having a wavelength longer than that of roughness, and can be de...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B24B37/00C09G1/02C09K3/14C09K13/06G11B5/84
CPCC09G1/02C09K3/1463C09K3/1409
Inventor KITAYAMA, HIROAKIFUJII, SHIGEO
Owner KAO CORP