Nonvolatile ferroelectric memory device

a ferroelectric memory and non-volatile technology, applied in semiconductor devices, digital storage, instruments, etc., can solve the problems of difficult random access operation, difficult to perform normal cell operation, interface noise generation between cells, etc., and achieve the effect of improving the data maintaining characteristi

Inactive Publication Date: 2006-06-29
SK HYNIX INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0013] Accordingly, it is an object of the present invention to form a floating channel layer comprising a N-type drain region, a P-type channel region and N-type source region between a word line and a bottom word line, thereby improving a data maintaining characteristic.
[0014] It is another object of the present invention to provide the above-described memory cell so as to control read / write operations of a memory cell array, thereby improving reliability of the cell and reducing the whole size of the cell at the same time.

Problems solved by technology

However, in the conventional nonvolatile FeRAM device, when the cell size becomes smaller, a data maintaining characteristic is degraded, so that it is difficult to perform the normal operation of the cell.
That is, a voltage is applied to an adjacent cell at read / write modes to destroy data of unselected cells, so that interface noise is generated between the cells and it is difficult to perform a random access operation.

Method used

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Examples

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Embodiment Construction

[0038] The present invention will be described in detail with reference to the accompanying drawings.

[0039]FIGS. 2a to 2c are diagrams illustrating a cross section of a cell and its symbol of a nonvolatile ferroelectric memory device according to an embodiment of the present invention.

[0040]FIG. 2a is a cross-sectional diagram illustrating a unit cell in a direction in parallel with a word line.

[0041] A bottom word line 10 formed in the bottom layer of the unit cell is arranged in parallel with a word line 17 formed in the top layer of the unit cell. Here, the bottom word line 10 and the word line 17 are selectively driven by the same row address decoder (not shown). An oxide layer 11 is formed on the bottom word line 10, and a floating channel layer 15 comprising a P-type channel region 12 is formed on the oxide layer 11.

[0042] A ferroelectric layer 16 is formed on the floating channel layer 15, and the word line 17 is formed on the ferroelectric layer 16.

[0043]FIG. 2b is a cr...

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Abstract

A nonvolatile ferroelectric memory device is provided so as to control read / write operations of a nonvolatile memory cell using a channel resistance of the memory cell which is differentiated by polarity states of a ferroelectric material. In the memory device, an insulating layer is formed on a bottom word line, and a floating channel layer comprising a N-type drain region, a P-type channel region and a N-type source region is formed on the insulating layer. Then, a ferroelectric layer is formed on the floating channel layer, and a word line is formed on the ferroelectric layer. As a result, the resistance state induced to the channel region is controlled depending on the polarity of the ferroelectric layer, thereby regulating the read / write operations of the memory cell array.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention generally relates to a nonvolatile ferroelectric memory device, and more specifically, to a technology of controlling read / write operations of a nonvolatile ferroelectric memory cell using a channel resistance of a memory cell which is differentiated by polarity states of a ferroelectric material in a nano scale memory device. [0003] 2. Description of the Related Art [0004] Generally, a ferroelectric random access memory (hereinafter, referred to as ‘FeRAM’) has attracted considerable attention as next generation memory device because it has a data processing speed as fast as a Dynamic Random Access Memory (hereinafter, referred to as ‘DRAM’) and conserves data even after the power is turned off. [0005] The FeRAM having structures similar to the DRAM includes the capacitors made of a ferroelectric substance, so that it utilizes the characteristic of a high residual polarization of the ferroelec...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01L29/94
CPCG11C11/22H01L21/84H01L27/11502H01L27/11585H01L27/1159H01L29/6684H01L29/7841H01L29/78391H10B53/00H10B51/00H10B51/30
Inventor KANG, HEE BOKAHN, JIN HONGLEE, JAE JIN
Owner SK HYNIX INC
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