Applicator for applying fluid to a substrate, comprising valve mechanisms, method for cleaning said applicator, and valve mechanisms for said applicator

Abstract

Disclosed is an applicator (1) for applying fluid to a substrate, comprising valve mechanisms (21) which are arranged in a row and are each equipped with an application valve nozzle (31), and a distributing fluid chamber (11) that has a fluid intake duct (110). A cleaning valve mechanism (21) which is incorporated into the row of application valve mechanisms (21) and is fitted with a cleaning valve nozzle (30) is associated with the fluid intake duct (110). A flow path (100) for cleaning the fluid chamber (11) is formed between the fluid intake duct (110) and the cleaning valve mechanism (20) in the distributing fluid chamber (11), said flow path (100) being effective when the cleaning valve nozzle (30) is open. Also disclosed is a method for cleaning said applicator (1). In said method, pressurized cleaning fluid is applied to the distributing fluid chamber (11), the application valve mechanisms (21) are kept closed while the cleaning valve nozzle (30) is opened, and the cleaning valve nozzle (30) is then closed while the application valve mechanisms are opened when the pressurized cleaning fluid is applied to the distributing fluid chamber (11). A valve mechanism (2) of the applicator (1) encompasses a detachably mounted nozzle diaphragm (3, 4) which unblocks a valve piston (51) in the removed state. The valve mechanism (2) further encompasses a straight fluid duct that remains free of flow corners. A setting piston (61) is movably mounted for adjusting and setting the stroke of the valve piston (51).

Description

[0001]This application is a 35 U.S.C. §371 filing of International Patent Application No. PCT / EP2008 / 004122 filed May 20, 2008, which designates the United States and claims the benefit of European Application No. 07090124.4 filed Jun. 14, 2007.BACKGROUND OF THE INVENTION[0002]The invention concerns an application device for applying fluid to a substrate, comprising valve devices which are arranged in a row and are each equipped with an application valve nozzle for emitting the fluid under pressure and with associated valve actuating device for controlling the emission of fluid by closing and opening the application valve nozzles, and comprising a common distributing fluid chamber which can be subjected to pressure from the fluid and which connects the application valve devices to each other for admission of the fluid, the distributing fluid chamber being provided with a fluid intake duct which is arranged in such a way that the fluid which is under pressure in the distributing flui...

AI Technical Summary

Benefits of technology

[0005]The invention is based on the aims of improving and simplifying the cleaning of the application device and its valve devices. The application device and the valve device are to be capable of being effectively and easily cleaned in a large number of cases even without dismantling, in particular also while retaining adjustment settings of the valve nozzles.

Problems solved by technology

Contamination occurs in particular after an initial assembly.

But breakdowns due to deposits also occur while operation is ongoing.

Conventional application devices then usually have to be completely or largely dismantled into their constituent parts and, after subsequent assembly, adjusted with considerable effort using separate micrometric measuring devices.

Images