Disclosed is an applicator (1) for applying fluid to a substrate, comprising valve mechanisms (21) which are arranged in a row and are each equipped with an application valve 
nozzle (31), and a distributing fluid chamber (11) that has a 
fluid intake duct (110). A cleaning valve mechanism (21) which is incorporated into the row of application valve mechanisms (21) and is fitted with a cleaning valve 
nozzle (30) is associated with the 
fluid intake duct (110). A flow path (100) for cleaning the fluid chamber (11) is formed between the 
fluid intake duct (110) and the cleaning valve mechanism (20) in the distributing fluid chamber (11), said flow path (100) being effective when the cleaning valve 
nozzle (30) is open. Also disclosed is a method for cleaning said applicator (1). In said method, pressurized cleaning fluid is applied to the distributing fluid chamber (11), the application valve mechanisms (21) are kept closed while the cleaning valve nozzle (30) is opened, and the cleaning valve nozzle (30) is then closed while the application valve mechanisms are opened when the pressurized cleaning fluid is applied to the distributing fluid chamber (11). A valve mechanism (2) of the applicator (1) encompasses a detachably mounted nozzle diaphragm (3, 4) which unblocks a valve 
piston (51) in the removed state. The valve mechanism (2) further encompasses a straight fluid duct that remains free of flow corners. A setting 
piston (61) is movably mounted for adjusting and setting the 
stroke of the valve 
piston (51).