Unlock instant, AI-driven research and patent intelligence for your innovation.

Dual tone development with plural photo-acid generators in lithographic applications

a technology of photo-acid generator and lithographic application, which is applied in the direction of photosensitive material processing, photomechanical equipment, instruments, etc., can solve the problems of increasing the complexity of lithography equipment, reducing the resolution limit of double patterning, and increasing the integration cost of lithography equipment, so as to improve the process latitude

Active Publication Date: 2010-10-28
TOKYO ELECTRON LTD
View PDF26 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0020]The invention relates to a method and system for patterning a substrate using a dual tone development process. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process.

Problems solved by technology

However, many of these approaches, including EUV lithography, RET lithography, and immersion lithography, have added considerable cost and complexity to lithography equipment.
Furthermore, many of these approaches continue to face challenges in integration and challenges in extending their resolution limits to finer design nodes.
Herein, the double patterning approach may require an excessive number of steps, including exiting the coating / developing tool and re-application of a second layer of radiation-sensitive material.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Dual tone development with plural photo-acid generators in lithographic applications
  • Dual tone development with plural photo-acid generators in lithographic applications
  • Dual tone development with plural photo-acid generators in lithographic applications

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034]A method and system for patterning a substrate is disclosed in various embodiments. However, one skilled in the relevant art will recognize that the various embodiments may be practiced without one or more of the specific details, or with other replacement and / or additional methods, materials, or components. In other instances, well-known structures, materials, or operations are not shown or described in detail to avoid obscuring aspects of various embodiments of the invention.

[0035]Similarly, for purposes of explanation, specific numbers, materials, and configurations are set forth in order to provide a thorough understanding of the invention. Nevertheless, the invention may be practiced without specific details. Furthermore, it is understood that the various embodiments shown in the figures are illustrative representations and are not necessarily drawn to scale.

[0036]Reference throughout this specification to “one embodiment” or “an embodiment” or variation thereof means tha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a continuation of and claims the benefit of priority under 35 USC §120 from U.S. Ser. No. 12 / 430,203, filed Apr. 27, 2009. The entire content of this application is herein incorporated by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The invention relates to a method for patterning a substrate. In particular, the invention relates to a method for patterning a substrate using dual tone development.[0004]2. Description of Related Art[0005]In material processing methodologies, such as those used in the fabrication of micro-electronic devices, pattern etching is often utilized to define the intricate patterns associated with various integrated circuit elements. Pattern etching comprises applying a patterned layer of radiation-sensitive material, such as photo-resist, to a thin film on an upper surface of a substrate, and transferring the pattern formed in the layer of radiation-sensitive materia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/20
CPCG03F7/095G03F7/70466G03F7/30
Inventor FONSECA, CARLOS A.SOMERVELL, MARKSCHEER, STEVENPRINTZ, WALLACE P.
Owner TOKYO ELECTRON LTD