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Dressing jig for glass substrate polishing pad

Inactive Publication Date: 2011-05-19
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0007]The present invention has objects to provide a dressing jig suitable for polishing a glass substrate, a method for polishing a glass substrate using the dressing jig, the method having excellent productivity, and a method for manufacturing a glass substrate.
[0009]The dressing jig according to the present invention has a specific surface roughness. As a result, the dressing jig does not require a separate dressing jig (for example, a smooth substrate having arithmetic average roughness Ra of less than 0.1 μm), and can adjust a polishing pad for a glass substrate to a desired state. Therefore, use of the dressing jig of the present invention (hereinafter referred to as the “present dressing jig”) can provide a polishing method having excellent productivity.
[0010]The glass substrate manufactured by polishing a glass substrate using a polishing pad having been subjected to a dress treatment with the present dressing jig having a specific surface roughness has excellent micro waviness characteristics and arithmetic average roughness characteristics of a main surface thereof. Furthermore, the polishing pad having been subjected to a dressing treatment using the present dressing jig has subsidiary effects that water-soluble polymers and surfactants remaining in the polishing pad can efficiently be removed and decrease in polishing efficiency due to the residual materials can be prevented.

Problems solved by technology

Thus, the proposed method has poor productivity.Patent Document 1: JP-A-2008-112572Patent Document 2: Japanese Patent No. 4234991Patent Document 3: JP-A-2003-117823

Method used

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  • Dressing jig for glass substrate polishing pad
  • Dressing jig for glass substrate polishing pad
  • Dressing jig for glass substrate polishing pad

Examples

Experimental program
Comparison scheme
Effect test

example 1

Working Example

[0069]Dressing treatment of a polishing pad was conducted using a disk-like glass substrate (diameter: 65 mm) having an average surface roughness Ra of 1.25 μm, comprising SiO2 as a main component as a dressing jig, thereby conducting finish polishing of a glass substrate for a magnetic recording medium. The dressing treatment was carried out while supplying a dressing liquid containing colloidal silica (colloidal silica having an average grain size of primary particles of from about 20 to 30 nm). The average surface roughness Ra of the dressing jig after the dressing treatment was 0.35 and an amount of change of the average surface roughness Ra before and after the dressing treatment was 72%. The average surface roughness Ra of the polishing surface of the polishing pad after the dressing treatment was 1.85 μm.

example 2

Comparative Example

[0070]The dressing treatment was conducted in the same manner as in Example 1, except for using a disk-like glass substrate having an average surface roughness Ra of 0.08 μm as the dressing jig, thereby conducting finish polishing of a glass substrate for a magnetic recording medium. The average surface roughness Ra of the dressing jig after the dressing treatment was 0.07 μm, and an amount of change of the average surface roughness Ra before and after the dressing treatment was 13%. The average surface roughness Ra of the polishing surface of the polishing pad after the dressing treatment was 2.45 μm.

example 3

Comparative Example

[0071]The dressing treatment was conducted in the same manner as in Example 1, except for using a dressing jig having an average surface roughness Ra of 2.75 (#600 diamond dressing jig) as the dressing jig, thereby conducting finish polishing of a glass substrate for a magnetic recording medium.

[0072]The average surface roughness Ra of the polishing surface of the polishing pad after the dressing treatment of Example 1 could be adjusted low as compared with Example 2 which is Comparative Example. It is presumed from this fact that the present dressing jig can conduct a stepwise dressing treatment by one dressing jig as if the dressing treatment was conducted using a plurality of dressing jigs having different average surface roughness Ra by that the average surface roughness Ra greatly changes during the dressing treatment.

[0073]The average surface roughness Ra of the dressing jig and the average surface roughness Ra of the polishing surface of the polishing pad a...

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Abstract

Dressing treatment of a polishing pad, adjusting a polishing surface of the polishing pad to given flatness and surface roughness without deteriorating productivity, a method for polishing a glass substrate, including polishing a main surface of a glass substrate using the polishing pad adjusted by the dressing treatment, and a method for manufacturing a glass substrate using the polishing method are provided. A dressing jig having arithmetic surface roughness on a surface performing dressing treatment of from 0.10 μm to 2.5 μm is used as the dressing jig for adjusting a polishing surface of the polishing pad to given flatness and surface roughness. A main surface of the glass substrate is polished with the polishing surface of the polishing pad having been subjected to a dressing treatment using the dressing jig.

Description

FIELD OF THE INVENTION[0001]The present invention relates to a dressing jig for a polishing pad for polishing a glass substrate, a method for polishing a glass substrate using the dressing jig, and a method for manufacturing a glass substrate.BACKGROUND OF THE INVENTION[0002]To finish a main surface of a glass substrate in a smooth mirror surface, polishing of the glass substrate using a polishing pad is performed. One example of the polishing includes a method for polishing a main surface of a glass substrate, comprising placing a polishing pad comprising a polyurethane resin or the like on a platen surface of a polishing apparatus, subjecting a polishing surface of the polishing pad to dressing treatment using a dressing jig to obtain given flatness and surface roughness, and relatively moving the glass substrate and the polishing pad in a state that the polishing surface of the polishing pad is pressed against the main surface of the glass substrate while supplying a polishing sl...

Claims

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Application Information

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IPC IPC(8): B24B1/00B24B47/26B24B53/017B24B53/02B24B53/12G11B5/73G11B5/84
CPCB24B53/017B24B7/228
Inventor TERADA, KENICHIROMANNAMI, KAZUOTAMADA, MINORU
Owner ASAHI GLASS CO LTD
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