Light-emitting diode and manufacturing method thereof
a technology of light-emitting diodes and manufacturing methods, which is applied in the direction of semiconductor/solid-state device manufacturing, electrical apparatus, semiconductor devices, etc., can solve the problems of difference in voltage characteristics, inability to achieve the goal of double-side emission, and complex design of control circuits
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[0029]FIGS. 1A-1D are schematic cross-sectional flowcharts illustrating a manufacturing process of a light-emitting (LED) diode according to an embodiment of the present invention.
[0030]First, as shown in FIG. 1A, a transparent substrate 100 whereon a transparent conductive material layer 110 has been formed is provided. A method of forming the transparent conductive material layer 110 is, for example, evaporation. A thickness of the transparent conductive material layer 110 can be between 1600˜2100 angstrom (Å), and a resistance of the transparent conductive material layer 110 is 10 ohmic (Ω).
[0031]FIG. 1B is a schematic cross-sectional diagram showing a first transparent conductive layer and a second transparent conductive layer formed on the transparent conductive material layer depicted in FIG. 1A. The first transparent conductive layer 113 and the second transparent conductive layer 114 are formed through etching the transparent conductive material layer 110. The method for etc...
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