Unlock instant, AI-driven research and patent intelligence for your innovation.

Electrostatic discharge (ESD) protection device

a protection device and electrostatic discharge technology, applied in semiconductor devices, semiconductor/solid-state device details, electrical apparatus, etc., can solve the problems of damage devices, and the protection device with improved holding voltage cannot protect the internal circuit of the devi

Active Publication Date: 2014-02-27
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
View PDF0 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent text describes an electrostatic discharge (ESD) protection device used in semiconductor devices. The device includes a semiconductor substrate, an epitaxy layer, and an isolation pattern. It also includes a gate, first and second doped regions, and a drain doped region. The technical effects of the device include improved protection against electrostatic discharge, reduced device size, and improved performance.

Problems solved by technology

Therefore, when integrated circuit devices are operated under normal operating conditions, unwanted transients, such as current and voltage surges, result in latch-up events which damage devices.
Therefore, the conventional ESD protection device with improved holding voltage still can not protect the internal circuits of the device.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electrostatic discharge (ESD) protection device
  • Electrostatic discharge (ESD) protection device
  • Electrostatic discharge (ESD) protection device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016]The following description is of a mode for carrying out the invention. This description is made for the purpose of illustrating the general principles of the invention and should not be taken in a limiting sense. The scope of the invention is best determined by reference to the appended claims. Wherever possible, the same reference numbers are used in the drawings and the descriptions to refer the same or like parts.

[0017]The present invention will be described with respect to particular embodiments and with reference to certain drawings, but the invention is not limited thereto and is only limited by the claims. The drawings described are only schematic and are non-limiting. In the drawings, the size of some of the elements may be exaggerated and not drawn to scale for illustrative purposes. The dimensions and the relative dimensions do not correspond to actual dimensions to practice the invention.

[0018]FIG. 1 is a cross section of one embodiment of an electrostatic discharge...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An electrostatic discharge (ESD) protection device is provided. The ESD protection device includes an epitaxy layer disposed on a semiconductor substrate. An isolation pattern is disposed on the epitaxy layer to define a first active region and a second active region, which are surrounded by a first well region. A gate is disposed on the isolation pattern. A first doped region and a second doped region are disposed in the first active region and the second active region, respectively. A drain doped region is disposed in the first doped region. A source doped region and a first pick-up doped region are disposed in the second doped region. A source contact plug having an extended portion connects to the source doped region. A ratio of an area of the extended portion covering the first pick-up doped region to an area of first pick-up doped region is between zero and one.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to an electrostatic discharge (ESD) protection device, and in particular, to an electrostatic discharge (ESD) protection device with the ability to adjust holding voltage and trigger voltage.[0003]2. Description of the Related Art[0004]In conventional high voltage device processes, a holding voltage of an electrostatic discharge (ESD) protection device usually is not larger than an operation voltage (VDD) of a device. Therefore, when integrated circuit devices are operated under normal operating conditions, unwanted transients, such as current and voltage surges, result in latch-up events which damage devices. However, the conventional ESD protection device is improved to increase the holding voltage, the trigger voltage simultaneously increases. Therefore, the conventional ESD protection device with improved holding voltage still can not protect the internal circuits of the device.[0005]Th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): H01L23/60
CPCH01L27/0248H01L27/0259
Inventor JOU, YEH-NING
Owner VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More