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Rotation mechanism for gas exhaust pump, manufacturing method of the same, gas exhaust pump having rotation mechanism, and manufacturing method of the same

a technology of rotating mechanism and gas exhaust pump, which is applied in the direction of rotary/oscillating piston pump components, machines/engines, liquid fuel engines, etc., can solve the problems of limited machining accuracy and may not be sufficient to provide only the oil seal member b>113/b>, so as to achieve the effect of maintaining a certain rotation performance and greatly reducing the use of seal gas

Inactive Publication Date: 2014-07-03
TOHOKU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The gas exhaust pump with the rotation mechanism described in this patent reduces the use of seal gas and maintains its rotation performance even with extended and high-speed use. This means that it can operate for longer periods of time with fewer errors.

Problems solved by technology

Meanwhile, various types of pumps are used in a manufacturing apparatus or production system of display devices which use semiconductor devices, liquid crystal, organic EL, and the like, and functional devices such as solar cell devices, due to limitations of application ranges depending on the pumping performance.
However, in view of the limitation of machining accuracy or the expansion caused by heat generated during operation, the gaps must be designed to have a certain width under the present circumstances.
However, providing only the oil seal member 113 may not be sufficient.

Method used

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  • Rotation mechanism for gas exhaust pump, manufacturing method of the same, gas exhaust pump having rotation mechanism, and manufacturing method of the same
  • Rotation mechanism for gas exhaust pump, manufacturing method of the same, gas exhaust pump having rotation mechanism, and manufacturing method of the same
  • Rotation mechanism for gas exhaust pump, manufacturing method of the same, gas exhaust pump having rotation mechanism, and manufacturing method of the same

Examples

Experimental program
Comparison scheme
Effect test

example

[0201]The rotating shaft 105 and the cylindrical seal housing 108 were formed in the following manner.

[0202]A lubricating oil supply path 109 was provided in the rotating shaft 105. A plurality of sets of the rotating shaft and the seal housing were prepared. SUS316L was used for the base materials.

[0203]In the same manner as in Experiment 1, after cleaning treatment was performed on cut surfaces, electrolytic polishing was performed for mirror finish.

[0204]The rotating shaft and the seal housing on which the electrolytic polishing was performed were subjected to degreasing and cleaning with ultrapure water, and the electrolytically-polished surfaces were cleaned. For the rotating shaft and the seal housing thus treated, their mirror-finished surfaces (the outer wall surface of the rotating shaft and the inner wall surface of the seal housing) were provided with a PFA film to have a uniform thickness as in Experiment 1.

[0205]In consideration of the diameter of the rotating shaft, th...

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Abstract

In a gas exhaust pump, there is provided a rotation mechanism that can ensure safe rotation and can greatly reduce the usage of a seal gas. A rotation mechanism of the present invention is formed of a rotating shaft and a seal housing. Between the rotating shaft and the seal housing, there is provided a predetermined gap. On at least one of an outer surface of the rotating shaft and an inner surface of the seal housing, there is provided a PFA film. As to a PFA film on a surface of at least one of the rotating shaft and the seal housing, after coating with PFA the wall surface of the rotation mechanism member defining at least the gap, followed by melting and remelting processes, the PFA film is formed to have a high smoothness on its free surface.

Description

TECHNICAL FIELD[0001]The present invention relates to a rotation mechanism for a gas exhaust pump used in an apparatus for manufacturing semiconductor devices and electronic devices which use semiconductor-related technology, such as liquid crystal display devices, solar cells, organic EL devices, and LEDs (hereinafter referred to as “semiconductor application electronic devices”), or in an apparatus for manufacturing electronic components for the electronic devices, a manufacturing method of the rotation mechanism for a gas exhaust pump, a gas exhaust pump having the rotation mechanism, and a manufacturing method of the gas exhaust pump having the rotation mechanism.BACKGROUND ART[0002]As a gas exhaust pump capable of high-speed and longtime continuous operation, there is conventionally known, for example, a positive displacement screw pump having a pair of screw rotors in a housing (see NPL 1). Recently, there is a need for establishment of techniques for manufacturing gas exhaust...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): F01D5/02
CPCF01D5/02F04C25/02F04C27/009F04C18/16F04C2230/91F04C29/023F04C2220/30Y10T29/49236
Inventor IWAKI, MASAMICHIOHMIOHYAMA, KENJIAKUTSU, ISAOIIZUKA, HAJIME
Owner TOHOKU UNIV