Light emitting diode and method of the same

Abstract

A light emitting diode and a method of the same are provided. The light emitting diode includes a light-emitting structure, a silicon substrate and a bonding layer. The light-emitting structure includes two semiconductor layers of different doped types. The light-emitting structure is capable of emitting light when a current passes through. The silicon substrate includes two zones of different doped types. The bonding layer is interposed between the light-emitting structure and the silicon substrate so that the semiconductor layer and the zone closest to the bonding layer are of different doped types.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application claims priority to Taiwan Patent Application No. 093112012 entitled “Light Emitting Diode and Method of the Same”, filed on Apr. 29, 2004, which is incorporated herein by reference and assigned to the assignee herein.FIELD OF INVENTION[0002]The present invention generally relates to a light emitting diode and a method of the same.BACKGROUND OF THE INVENTION[0003]High illumination light emitting diodes generally use GaAs substrates or sapphire substrates, which are poor in thermal dissipation and not suitable for high power applications. Conventionally, the light emitting structure formed on the GaAs substrate or the sapphire substrate is transferred onto a silicon substrate by wafer bonding technology, and then the GaAs or sapphire substrate is removed so as to solve the thermal dissipation problem.[0004]Horng et al. published an article entitled “AlGaInP light-emitting diodes with mirror substrates fabricated by wafer bo...

AI Technical Summary

Benefits of technology

[0008]In one embodiment of the present invention, the light emitting diode includes a light emitting structure, a silicon substrate, and a bonding layer. The light emitting structure includes two semiconductor layers of different doped types. When a current passes through, the light emitting structure is capable of emitting light. The silicon substrate has two zones of different doped types. The bonding layer is interposed between the light emitting structure and the silicon substrate so that the semiconductor layer and the zone closest to the bonding layer are of different doped types. The bias applied on the light emitting structure in the present invention is a reverse bias with respect to the two zones of the silicon substrate so as to achieve the purpose of insulation. The two zones of the silicon substrate exhibit a Zener diode effect, which is capable of preventing static discharges.

[0012]Another aspect of the present invention is to provide a method of forming a light emitting diode. The method includes providing a light emitting structure including two semiconductor layers of different doped types. The light emitting structure is capable of emitting light when a current passes through. A silicon substrate having two zones of different doped types is also provided. By means of a bonding layer, the light emitting structure and the silicon substrate are bonded together so that the semiconductor layer and the zone closest to the bonding layer are of different doped types. The bias applied on the light emitting structure in the present invention is a reverse bias with respect to the two zones of the silicon substrate so as to achieve insulation purpose. The two zones of the silicon substrate exhibit a Zener diode effect, which is capable of preventing static discharges.

Problems solved by technology

High illumination light emitting diodes generally use GaAs substrates or sapphire substrates, which are poor in thermal dissipation and not suitable for high power applications.

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