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Spin coating apparatus and coated substrate manufactured using the same

A substrate and coating technology, which is applied in the manufacture of optical record carriers, optical recording/reproduction, instruments, etc., can solve the problems of lower productivity, difficult to remove resin, etc., and achieve the effect of reducing pollution

Inactive Publication Date: 2007-08-29
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this method, since the UV light is irradiated from the spin coater, the UV curable resin remaining in the spin coater is hardened when the spin coating is performed, so it is difficult to remove the remaining resin
Also, since this method requires an operation of cutting a portion with an unstable thickness, productivity is reduced

Method used

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  • Spin coating apparatus and coated substrate manufactured using the same
  • Spin coating apparatus and coated substrate manufactured using the same
  • Spin coating apparatus and coated substrate manufactured using the same

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0039] 4, the height of the inner part of the upper surface 40b of the annular member is equal to the height of the substrate, the upper surface 40b of the annular member is inclined outward at an angle of 15°, and the inner surface 40f of the annular member is inclined outward at an angle of 45°. The diameter of the support surface contacting the substrate 10 was 80 mm. The ring part and the support body are made of aluminium. Polycarbonate (PC) injection molding was performed with a thickness of 1.1 mm, an outer diameter of 120 mm and an inner diameter of 15 mm (the diameter of the central hole). Then, by using sputtering treatment, forming Ag alloy / ZnS-SiO 2 / SbGeTe / ZnS-SiO 2 A four-layer structure is used to manufacture the substrate 10 . Then, by using a spin coating device, spin coating EB8402 (manufactured by SKUCB) and Irgacure184 (manufactured by Ciba SC), 651 (manufactured by Ciba SC) and a UV curable resin with methyl ethyl ketone to form a cover layer with a thi...

example 2

[0041] The substrate of this example was produced in the same manner as in Example 1 except that the cover layer was 75 μm thick. Table 1 below shows the coating thickness according to the radius of the substrate.

example 3

[0043] The substrate of this example was produced in the same manner as in Example 1 except that the cover layer was 50 μm thick. Table 1 below shows the coating thickness according to the radius of the substrate.

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Abstract

In spin-coating a coating solution on a substrate using a conventional spin coating apparatus, the so-called ski-jump phenomenon occurs frequently at an outer edge of the substrate. A spin coating apparatus according to the present invention includes a ring-shaped or polygonal member. An upper portion of the ring-shaped or polygonal member has an inclined portion extending downward and outward, and an inner portion of the inclined portion is adjacent to or in contact with an outer edge of a substrate. An inner side surface of the ring-shaped or polygonal member is inclined downward and outward. When a surface of the substrate is coated with a coating solution using the spin coating apparatus, a ski-jump phenomenon occurring at an outer edge of the substrate can be reduced and contamination of the substrate due to the coating solution can be prevented.

Description

technical field [0001] The present invention relates to a spin coating device, and more particularly, to a device capable of reducing the ski-jump phenomenon (also called ski-jump) that occurs at the outer edge of a substrate when spin coating is performed using a ring-shaped part or a polygonal part. bumps, bumps, bumps, protrusions, beads, etc.) and coated substrates manufactured using the spin coating device. Background technique [0002] Figure 1 is a side view of a coating solution spin-coated on a substrate using conventional methods. In said method, a liquid coating solution is dripped onto a central portion of a substrate rotating at a low speed. Then, the substrate is rotated at high speed. Due to centrifugal force, the coating solution spreads outward from the center of the substrate until it coats the entire substrate. However, when a highly viscous coating solution is coated on a substrate in a conventional spin coater method, the coating solution accumulates ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G11B7/26
CPCG11B7/266
Inventor 姜太植韩美英李成根张城勋洪瑛晙
Owner LG CHEM LTD