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Exposure apparatus, method for producing device, and method for controlling exposure apparatus

A technology of exposure device and control method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, semiconductor/solid-state device manufacturing, etc., can solve problems such as poor exposure processing, device and component failure, leakage, etc., and achieve shortening The time required to resume work, the prevention of failure of electrical equipment itself, and the effect of preventing leakage

Inactive Publication Date: 2009-01-14
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, in the liquid immersion exposure apparatus, if the liquid for exposure leaks or enters, there is a possibility that the liquid will cause problems such as failure of the device and components, electric leakage, or rust.
In addition, exposure processing cannot be performed well

Method used

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  • Exposure apparatus, method for producing device, and method for controlling exposure apparatus
  • Exposure apparatus, method for producing device, and method for controlling exposure apparatus
  • Exposure apparatus, method for producing device, and method for controlling exposure apparatus

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Embodiment Construction

[0096] Embodiments of the exposure apparatus of the present invention will be described below with reference to the drawings, but the present invention is not limited thereto.

[0097] FIG. 1 is a schematic configuration diagram showing a first embodiment of the exposure apparatus of the present invention. In FIG. 1 , the exposure apparatus EX has a mask stage MST supporting a mask M, a substrate stage PST supporting a substrate P, and illumination optics for illuminating the mask M supported on the mask stage MST with exposure light EL. The system IL is the projection optical system PL for projecting and exposing the pattern example of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST, and the control device CONT for collectively controlling the operation of the entire exposure apparatus EX. An alarm device K that issues an alarm when an abnormality occurs in the exposure process is connected to the control device CONT. ...

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Abstract

An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

Description

technical field [0001] The present invention relates to an exposure device for exposing a substrate through a projection optical system and liquid, a device manufacturing method using the exposure device, and a control method for the exposure device. Background technique [0002] A semiconductor device or a liquid crystal display device is manufactured by a so-called photolithography method in which a pattern formed on a mask is transferred to a photosensitive substrate. The exposure apparatus used in this photolithography process has a mask stage for supporting a mask and a substrate stage for supporting a substrate, and transfers the pattern of the mask to the substrate by a projection optical system while moving the mask stage and the substrate stage in sequence. In recent years, in order to cope with the further high integration of device patterns, it is desired to obtain higher resolution of the projection optical system. The shorter the exposure wavelength used and th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
Inventor 马込伸贵小林直行榊原康之高岩宏明
Owner NIKON CORP