Load locking chamber unit

Abstract

Provided is a substrate processing apparatus (1) in which a conveying device in a conveying chamber can be carried out of the substrate processing apparatus regardless of the height of an installation place. The substrate processing apparatus comprises a processing chamber (10a-10c) for performing prescribed processing on a substrate S in vacuum, a conveying chamber (20) coupled with the processing chamber and provided with the conveying device (50) for conveying the substrate S while being held in vacuum, and a load lock chamber (30) provided between the conveying chamber (20) and a substrate container (40) on the atmosphere side, wherein a space (310) exists under the load lock chamber (30). The conveying device (50) can be divided into an upper structure (500A) and a lower structure (500B), wherein the upper structure (500A) can be carried out of the substrate processing apparatus from above the conveying chamber (20), and the lower structure (500B) can be carried out of the apparatus from the underside of the conveying chamber (20) through the space (310) under the load lock chamber (30).

Description

technical field [0001] The present invention relates to a substrate processing apparatus for processing a large substrate such as a glass substrate for a flat panel display (FPD), a load lock chamber unit, and a transfer method for a transfer device. Background technique [0002] In the manufacturing process of a flat panel display (FPD) represented by a liquid crystal display (LCD), a plurality of vacuum processing devices including etching, ashing, film formation, etc. multi-chamber vacuum processing system. [0003] For such a vacuum processing system, it includes: a transfer chamber provided with a transfer device for transferring substrates and a plurality of processing chambers arranged around it, and a transfer arm in the transfer chamber carries the substrate to be processed into each processing chamber At the same time, the processed substrates are carried out from the processing chambers of each vacuum processing device. In addition, the load lock chamber is conn...

AI Technical Summary

Problems solved by technology

[0007] It is considered that these mechanisms should be avoided, and the cover at the bottom of the load lock chamber should be made into a rotating type. However, in the case of "single opening" with one end as the rotation axis, the cover cannot be fully opened, and sufficient protection cannot be ensured. Maintenance space, and in the case of "double opening", the open cover will hinder the maintenance access and deteriorate the operability

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