Nanometer precision real-time interferometric measurement device of object surface shape and measurement method therefor

A technology of interferometric measurement and object surface, which is used in measurement devices, optical devices, instruments, etc., to achieve the effect of short measurement time and improved measurement time

Inactive Publication Date: 2009-02-25
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0012] In the prior art [2], at least 4 interferograms are required for each measurement, the measurement time is 22ms, the measurement accuracy is 14nm, and the measurement range is less than half a wavelength

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  • Nanometer precision real-time interferometric measurement device of object surface shape and measurement method therefor

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Embodiment Construction

[0040] The present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the protection scope of the present invention should not be limited thereby.

[0041] see first figure 1 , figure 1 It is a structural schematic diagram of the nano-precision measuring device for the surface topography of the object of the present invention. It can be seen from the figure that the real-time interferometric measurement device with nanometer accuracy of the surface topography of the object of the present invention includes a light source 1, and along the forward direction of the output beam of the light source 1 are a collimating beam expander 2, a beam splitter 3 and an object to be measured 5 in sequence. , there is a reference mirror 4 in the direction of the reflected beam of the beam splitter 3, and a photodetection element 6 is provided in the direction of the transmitted beam in which the reflected beam of the reference mirror 4...

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Abstract

This invention relates to object surface shape nanometer accuracy real time intervene measurement device and its method, which adopts filter method phase bit measurement method, wherein, the invention real time intervene measurement device is to add phase detection circuit and real time phase data process circuit to process power sine modulation. This invention can process object surface shape with nanometer accuracy real time intervene measurement with large measurement range.

Description

technical field [0001] The invention relates to the measurement of the surface topography of an object, in particular to a real-time interferometric measurement device with nanometer accuracy and a measurement method thereof with the change range of the topography of the object surface within millimeters. Background technique [0002] In optical precision interferometry, sinusoidal phase modulation interferometry is a high-precision interferometry method, which can easily realize the phase modulation of the interference signal, so as to achieve high-precision measurement of parameters such as displacement, distance, and surface shape. In surface shape measurement, according to different phase resolution methods, it is divided into phase-locking method, Fourier analysis method, and integral method. Using the Fourier analysis method to solve the phase, the surface shape measurement can reach the precision of a few tenths of a nanometer, but many production occasions in modern ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00G01B11/24G01B9/02G01B9/023
Inventor 何国田王向朝
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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