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Exposure apparatus, exposure method, and method for producing device

A technology of exposure device and exposure method, which is applied in semiconductor/solid-state device manufacturing, photolithography exposure device, microlithography exposure equipment, etc., can solve troubles and other problems, and achieve the effect of preventing electrical equipment failure and leakage

Inactive Publication Date: 2009-05-06
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, since there is a possibility of causing trouble if the liquid is immersed in the substrate table, it is necessary to prevent the liquid from entering.

Method used

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  • Exposure apparatus, exposure method, and method for producing device
  • Exposure apparatus, exposure method, and method for producing device
  • Exposure apparatus, exposure method, and method for producing device

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Embodiment Construction

[0069] Hereinafter, the exposure apparatus of the present invention will be described with reference to the drawings, but the present invention is not limited thereto.

[0070] FIG. 1 is a schematic configuration diagram showing an embodiment of the exposure apparatus of the present invention. In FIG. 1 , the exposure apparatus EX includes a mask stage MST supporting a mask M, a substrate stage PST supporting a substrate P, and illumination optics for illuminating the mask M supported by the mask stage MST with an exposure beam EL. The system IL, the projection optical system PL for projecting and exposing the pattern image of the mask M illuminated by the exposure beam EL to the substrate P supported by the substrate stage PST, and the control for overall control of the overall operation of the exposure device EX device cont.

[0071] The exposure apparatus EX of this embodiment is a liquid immersion exposure apparatus to which a liquid immersion method is applied in order t...

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Abstract

An exposure apparatus (EX) includes a substrate stage (PST) movable while holding a substrate (P), a substrate alignment system (5) which detects an alignment mark (1) on the substrate (P) held by the substrate stage (PST) and detects a reference mark (PFM) provided on the substrate stage (PST), and a mask alignment system (6) which detects, via a projection optical system (PL), a reference mark (MFM) provided on the substrate stage (PST). The reference mark (PFM) on the substrate stage (PST) is detected without a liquid by using the substrate alignment system (5), and the reference mark (MFM) on the substrate stage (PST) is detected using the mask alignment system (6) via the projection optical system (PL) and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system (5) and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.

Description

technical field [0001] The present invention relates to an exposure device and an exposure method for exposing a pattern on a substrate via a projection optical system and a liquid, and a device manufacturing method. Background technique [0002] Microdevices such as semiconductor devices and liquid crystal display devices are manufactured by a method called photolithography in which a pattern formed on a mask is transferred to a photosensitive substrate. The exposure apparatus used in this photolithography process has a mask stage that supports the mask and a substrate stage that supports the substrate, and transfers the pattern of the mask to the image through the projection optical system while moving the mask stage and the substrate stage one by one. printed on the substrate. [0003] Since the above-mentioned micro-devices are formed by overlapping multiple layers of patterns on the substrate, when the patterns below the second layer are projected on the substrate, the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
Inventor 安田雅彦正田隆博金谷有步长山匡白石健一
Owner NIKON CORP