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Ion implantation process to raise anticorrosion performance of lumpy amorphous alloy

A technology of ion implantation and amorphous alloy, which is applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of poor corrosion performance and limit commercial applications, and improve corrosion resistance, energy and dose Precise and Controllable Effects

Inactive Publication Date: 2009-05-20
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Recently, a series of rare earth-based metallic glasses and magnesium-based metallic glasses have been developed with strong glass-forming ability, but the common weakness is poor corrosion performance, which greatly limits their future commercial applications

Method used

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  • Ion implantation process to raise anticorrosion performance of lumpy amorphous alloy
  • Ion implantation process to raise anticorrosion performance of lumpy amorphous alloy

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Step 1: La with a purity of 99.6%, Al with a purity of 99.5%, Cu with a purity of 99.95%, Ag with a purity of 99.8%, Ni with a purity of 99.8%, and Co with a purity of 99.9% were prepared by La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 The ratio is arc smelted in an argon atmosphere adsorbed by zirconium to obtain a uniformly mixed alloy ingot.

[0015] Step 2: Melt the ingot obtained in Step 1 on a water-cooled copper mold in an argon-protected melting furnace.

[0016] Step 3: inject the alloy solution obtained in step 2 into a water-cooled copper mold with an inner diameter of 5 mm by using the pressure difference. A bulk amorphous alloy is produced.

[0017] Step 4: Use MEVVA source ion implanter to implant Nb ions into La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 Bulk metallic glass surface, injection dose: 1×10 16 -1×10 17 Nb / cm 2 .

[0018] Step 5: Characterize the structure of the bulk amorphous before and after ion implantation by X-ray diffraction ...

Embodiment 2

[0022] Step 1: La with a purity of 99.6%, Al with a purity of 99.5%, Cu with a purity of 99.95%, Ag with a purity of 99.8%, Ni with a purity of 99.8%, and Co with a purity of 99.9% were prepared by La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 The ratio is arc smelted in an argon atmosphere adsorbed by zirconium to obtain a uniformly mixed alloy ingot.

[0023] Step 2: Melt the ingot obtained in Step 1 on a water-cooled copper mold in an argon-protected melting furnace.

[0024] Step 3: inject the alloy solution obtained in step 2 into a water-cooled copper mold with an inner diameter of 5 mm by using the pressure difference. A bulk amorphous alloy is produced.

[0025] Step 4: Use MEVVA source ion implanter to implant Ta ions into La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 Bulk metallic glass surface, injection dose: 1×10 16 -1×10 17 Ta / cm 2 .

[0026] Step 5: Characterize the structure of the bulk amorphous before and after ion implantation by X-ray diffraction....

Embodiment 3

[0029] Step 1: La with a purity of 99.6%, Al with a purity of 99.5%, Cu with a purity of 99.95%, Ag with a purity of 99.8%, Ni with a purity of 99.8%, and Co with a purity of 99.9% were prepared by La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 The ratio is arc smelted in an argon atmosphere adsorbed by zirconium to obtain a uniformly mixed alloy ingot.

[0030] Step 2: Melt the ingot obtained in Step 1 on a water-cooled copper mold in an argon-protected melting furnace.

[0031] Step 3: inject the alloy solution obtained in step 2 into a water-cooled copper mold with an inner diameter of 5 mm by using the pressure difference. A bulk amorphous alloy is produced.

[0032] Step 4: Use MEVVA source ion implanter to implant Cr ions into La 62 Al 14 (Cu 5 / 6 Ag 1 / 6 ) 14 Ni 5 co 5 Bulk metallic glass surface, injection dose: 1×10 16 -1×10 17 Cr / cm 2 .

[0033] Step 5: Characterize the structure of the bulk amorphous before and after ion implantation by X-ray diffraction....

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Abstract

The present invention discloses ion implantation process to raise anticorrosive performance of lumpy amorphous alloy. Lumpy amorphous alloy after being surface polished and alcohol cleaned is ion implanted in the vacuum chamber of an ion implanter at 20-40 kV voltage, 0.4-0.8 mA beam current and 1x10<16> to 1x10<17> / sq cm dosage to form surface anticorrosive layer. The technology of the present invention is superior to common microalloying, has high doping concentration, capacity of raising the anticorrosive performance of metglass alloy without lowering the glass forming ability and no change in the workpiece sizes and shape, and is especially suitable for the ultimate treatment of parts and products.

Description

technical field [0001] The invention relates to a method for improving the corrosion performance of bulk amorphous alloy by ion implantation. Background technique [0002] Since the discovery of new multi-component glass alloy systems in the early 1990s, bulk metallic glass materials have made great progress and become the most active subject in the field of metallic materials. This amorphous alloy is a new type of alloy material whose atomic arrangement is not periodic and symmetrical. Due to their special microstructure, they have superior mechanical, physical, chemical and magnetic properties, such as high strength, high hardness, wear resistance and corrosion resistance. These superior properties make amorphous alloys have potential applications in many fields. [0003] Recently, a series of rare-earth-based metallic glasses and magnesium-based metallic glasses have been developed with strong glass-forming ability, but the common weakness is poor corrosion performance,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/48C23C14/54C23C14/16C22C45/00
Inventor 蒋建中姜清奎
Owner ZHEJIANG UNIV
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