Method for preparing GaAs micro/nono optical element

A technology for optical elements and optical arrays, applied in the fields of optical elements, optics, microstructure technology, etc., can solve the problems of high, expensive, difficult, and expensive processing, and achieve the effect of low processing cost and high replication accuracy.
CN100564241CInactive Publication Date: 2009-12-02XIAMEN UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
XIAMEN UNIV
Publication Date
2009-12-02
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a method for preparing a micron / nanometer optical element on GaAs and a micron / nanometer optical element thereof, in particular to a preparation method in which the micron / nanometer optical array element is directly etched on the surface of semiconductor GaAs material at one time with low cost, simple method and no complex processes such as mask lithography and so on. The quartz with the micron / nanometer optical array element is taken as an original mother blank; a relief structure on the quartz micron / nanometer optical array element is accurately replicated on the surface of polymer material and then a Ti layer and a Pt layer are sputtered in sequence; the surface is then metallized to obtain a template electrode. The template electrode is used as a working electrode and is adjusted to be parallel to a processed workpiece GaAs; an electrochemical etching solution is added into an electrolytic cell and an etching agent is generated on the template electrode; a restraint agent in the etching solution is used for compressing the thickness of an etching agent layer to the thickness of a micron or a nanometer level; GaAs sheets are controlled to move to the surface of the template electrode until the structure on the template electrode is completely replicated on the surface of the processed workpiece and the separation of the GaAs sheets and the template electrode is controlled.
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Description

technical field

[0001] The invention relates to a micro / nano optical element, in particular to a processing tool for polymer material / Ti / Pt prepared by using hot embossing technology combined with magnetron sputtering coating technology, and then using electrochemical confinement etching processing technology in semiconductor A processing method and device for processing micro / nano optical array element structure by etching the surface of GaAs material. Background technique

[0002] Micro / nano optical elements refer to free optical curved surfaces and microstructured optical elements whose surface shape accuracy can reach submicron level and surface roughness can reach nanometer level. Due to its advantages of small size, light weight, flexible design, easy arraying and batch replication, it can complete new functions that traditional optical components cannot achieve, and can form many new optical systems (Zhou Haixian, Wang Yongnian, etc. Transl. Micro-optical components,...

Claims

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