Application of carboxymethyl chitosan quaternary ammonium salt as moisture absorption humectant

A technology of dimethylcarboxymethyl chitosan and quaternary ammonium salt, which is applied in the directions of skin care preparations, cosmetics, etc., can solve the problem that hyaluronic acid cannot be completely replaced, and achieves low cost, good performance and low price. Effect

Inactive Publication Date: 2010-02-24
烟台大境生物科技有限公司
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The moisture absorption and moisturizing properties of the two chitosan derivatives are related to the inserted active groups - quaternary ammonium base and carboxymethyl group, but neither of the two derivatives can completely replace hyaluronic acid

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Application of carboxymethyl chitosan quaternary ammonium salt as moisture absorption humectant
  • Application of carboxymethyl chitosan quaternary ammonium salt as moisture absorption humectant

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0012] The present invention uses carboxymethyl chitosan quaternary ammonium salt as a hygroscopic moisturizing agent. The carboxymethyl chitosan quaternary ammonium salt is N, N, N,-trimethyl carboxymethyl chitosan quaternary ammonium salt, N-ethyl-N, N-dimethyl carboxymethyl chitosan Quaternary ammonium salt, N-propyl-N, N-dimethyl chitosan quaternary ammonium salt, N-n-butyl-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt, N -Isobutyl-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt, N-phenyl-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt or N-salicylaldehyde-N , N-dimethyl carboxymethyl chitosan quaternary ammonium salt.

[0013] Result verification

[0014] Moisturizing agent and hyaluronic acid in the embodiment of the present invention are measured hygroscopicity under the relative humidity (RH) of 43% and relative humidity respectively under the humidity condition of 81%, and relative humidity is 43% and relative humidity is ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the cosmetic field, in particular to an application of carboxymethyl chitosan quaternary ammonium salt which is used as desiccating humectant. The carboxymethyl chitosan quaternary ammonium salt is N,N,N, trimethyl carboxymethyl chitosan quaternary ammonium salt, N- ethyl group-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt, N-propyl group-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt, N-butyl-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt, N- isobutyl group-N, N- dimethyl carboxymethyl chitosan quaternary ammonium salt, N-phenyl group-N, N-dimethyl carboxymethyl chitosan quaternary ammonium salt or N-salicylal group-N, and N-dimethyl carboxymethyl chitosan quaternary ammonium salt. The desiccating humectant of the invention has two activating groups which are quaternary ammonium salt base and carboxymethyl, the property hygroscopic and wet keeping is far higher than chitose, meanwhile the invention is better than hyaluronic acid, and the price of chitose is low, current price on market is far lower than hyaluronic acid. The invention is a desiccating humectant which has low cost and excellent property.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to the application of a carboxymethyl chitosan quaternary ammonium salt as a hygroscopic moisturizing agent. Background technique [0002] Hyaluronic acid is strongly hydrophilic and exhibits very good moisturizing properties. It is the best moisturizing substance found in nature at present, and its water retention value is as high as 500ml / g, which is better than glycerin, propylene glycol, sorbitol, polyethylene glycol, lactic acid, sodium pyrrolidone carboxylate and other humectants. It is recognized as the most ideal natural moisturizing factor by the international cosmetics industry. Today, there are more and more high-end cosmetics with hyaluronic acid added in the cosmetics market at home and abroad. Cosmetics containing hyaluronic acid are known as "bionic cosmetics", and cosmetics with hyaluronic acid have become mainstream products in the international daily chemical industry (Zh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/73A61Q19/00
Inventor 郭占勇苗凤萍衣悦涛王艳杨少丽
Owner 烟台大境生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products