Cosmetic compositions comprising sub-micron boron nitride particles

A cosmetic composition and a technology for the composition are applied in the field of optimizing the optical diffusion effect of light, and can solve the problems of blurred topography, radial diffusion of light, etc.

Inactive Publication Date: 2007-09-05
GENERAL ELECTRIC CO
View PDF3 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A general disadvantage of these formulations is that they simultaneously provide the ability to blur topographical imperfections such as wrinkles radially diffusing light and the ability to hide the opacity of colored imperfections

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Example 1: BN powder with an average primary particle size of 243nm and TiO with an average particle size of 170nm 2 Compare. TiO 2 is a filler used in prior art cosmetic compositions. Simple formulations for foundations are prepared such that both formulations have equal opacity or ability to hide colored imperfections. MTR measurements were performed comparing each of the following formulations containing BN submicron particles or TiO 2 Compositions. In the third formulation, the amount of BN was reduced by 1 / 2 and replaced with Tospearl 3210, a silicone microsphere produced by GE Toshiba Silicones in Japan.

[0044]In this formulation, the following ingredients were used: 10% Granules; 10% SF1528 (GE Silicones, Waterford, NY); 22.8% 600Mcstk PDMS; 57.2% D5. The formulation was applied to form a film with a wet thickness of 25 microns. In the transmittance test, both films had equivalent -50% transmittance. The results showed that: a) the MTR of the mask / film w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
particle sizeaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to view more

Abstract

A cosmetic compound containing safe and effective amount of boron nitride powder for skin, hair, and finger nails is disclosed, which can improve skin appearance by smoothing out lines and wrinkles, and can cover age pigment, blemishes, and discoloration.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from U.S. 60 / 777917, filed March 1, 2006, which is hereby incorporated by reference in its entirety. technical field [0003] This invention relates to compositions containing submicron particles of boron nitride for light management. The present invention also relates to methods of optimizing the optical diffusion effect of light, thereby blurring the appearance of wrinkles, lines, and reducing the visibility of discoloration to improve the appearance of the skin. Background technique [0004] Color cosmetics and foundations are typically used to improve an individual's appearance, including reducing the appearance of wrinkles or blemishes on an individual's skin. Cosmetic compositions in the prior art typically contain components such as metal oxides which provide opacity to the composition. These ingredients can be excellent for evening skin tone, but are unsatisfactory for certain...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/19A61Q19/00A61Q5/00A61Q3/02A61Q1/12A61Q1/10A61Q1/08A61Q1/06G02B1/10
Inventor M·D·布茨M·辛哈S·E·格诺韦斯山田雅子
Owner GENERAL ELECTRIC CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap